以不同高分子材料覆蓋布拉格光柵之波導非對稱OADM元件

Fabrication of an Asymmetric Bragg Coupler Filter with non-identical Core Materials

丁彥文(Yan-Wun Ding)

指導教授 ： 莊為群

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2014年)

摘要

本研究利用負光阻以黃光微影製程技術製作波導結構，並使用軟式微影模仁壓印技術結合全像干涉微影技術(Holographic Interference Lithography) 其週期可調等優點且大面積製作等優點，來製作光塞取多工器(optical add-drop multiplexer，OADM)元件，此元件之波導結構分為輸入及輸出端，內有兩通道一條細一條粗，在粗端波導底部利用全像干涉微影技術，製作布拉格光柵(Bragg Grating)於通道底端，整體呈現一條有光柵而另一條沒有光柵的結構，此非對稱的條件與光塞取多工器的動作條件一致，由此可得知本研究製作出的結構能夠達到其工作原理。完成後的波導元件是由折射率高的導光層和包覆著導光層且折射率低的批覆層所構成，通常導光層是由單一種高折射率的材料所構成，本研究主要是在導光層粗端底部的布拉格光柵區域內的一小段覆蓋上不同折射率的材料，藉此來研究並探討對於量測結果有何影響。

在研究中我們使用原子力顯微鏡(atomic force microscope，AFM) 來獲得布拉格光柵的週期及深度，還使用場發射掃描式電子顯微鏡(Field Emission Scanning Electron Microscope，FE-SEM)來觀察與探討波導結構，在最後量測的部分，採用可調式雷射Tunable Laser做為光源測量波導元件的穿透頻譜與經由光柵影響反射回來的反射頻譜。

關鍵字

全像干涉微影 ； 軟式微影技術 ； 光塞取多工器 ； 高分子波導

並列摘要

In this study, a negative photoresist with photolithography process technology waveguide structure and the use of soft lithography die-stamping Holographic Interference Lithography technology combines the advantages of adjustable cycle and its large area production, etc., to produce optical add-drop multiplexer element waveguide structure of this element into the input and output side, there are two channels of a thin a thick, coarse end of the waveguide at the bottom of the use of holographic interference lithography to produce Bragg Grating at the bottom of the channel, as a whole showed a grating and the other a no structural grating, this asymmetric conditions of light drop multiplexer consistent operating conditions, which can be made out of this study that the structure can achieve it works. After completion of the waveguide element is made of a high refractive index of the light guide layer and the cladding layer and a low refractive index optical guide layer composed of approvals, the photoconductive layer is usually made of a material composed of a single high refractive index, this study was in the short-side optical guide layer thick bottom Bragg grating regions of different refractive index materials on the cover, thereby to study and explore the impact element.

In this study we used the atomic force microscope to obtain a cycle and the depth of a Bragg grating , but also using a field emission scanning electron microscope to observe and investigate the waveguide structure, Finally, the measurement part , the use of tunable laser as the light source to measure the penetration tunable Laser spectrum and waveguide components reflected by the grating influence the reflection spectrum.

並列關鍵字

Holography Interference Lithography ； Soft Lithography ； OADM components ； Polymer waveguide

參考文獻

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