透過您的圖書館登入
IP:18.191.216.163
  • 學位論文

以非對稱波導填入不同高分子材料製作OADM元件

Asymmetric Waveguide Filled with Different Polymer Materials Production OADM Elements

指導教授 : 莊為群
若您是本文的作者,可授權文章由華藝線上圖書館中協助推廣。

摘要


本研究以微機電製程技術進行非對稱結構的高分子波導製作,並使用軟式微影模仁壓印技術結合全像干涉微影技術(Holographic Interference Lithography) 其週期可調且封裝成本低等優點,來製作光塞取多工器(optical add-drop multiplexer,OADM)元件。 此元件之波導結構分為兩通道一細一粗,在粗端波導底部利用全像干涉微影技術,製作布拉格光柵(Bragg Grating)於通道底端,形成非對稱的結構。製程中使用兩種不同的高分子材料填入波導,並且由折射率高的導光層和低折射率的批覆層所構成,達到全反射條件使光能在介質中進行傳遞。 本研究中以原子力顯微鏡(atomic force microscope,AFM)、場發射掃描式電子顯微鏡(Field Emission Scanning Electron Microscope,FE-SEM)等方法來觀察與探討波導結構,在量測的部分,以光頻譜分析儀與光波量測系統測量本元件之光學傳輸特性。

並列摘要


In this study, MEMS process technology asymmetric waveguide structure of polymer production, and the use of soft imprint lithography mold core technology with holographic interference lithography (Holographic Interference Lithography) whose period is adjustable and low cost packaging, to make the light plug take multiplexer (optical add-drop multiplexer, OADM) elements. This element of the waveguide structure is divided into two channels a thin one thick, thick end of the waveguide at the bottom of the use of holographic interference lithography to produce Bragg grating (Bragg Grating) in the bottom of the channel, forming a non-symmetrical structure. Manufacturing process using two different polymer materials filled waveguide, and is constituted by a high refractive index optical guide layer and a low refractive index layer Pifu achieve total reflection conditions in the medium energy passed. In this study, atomic force microscope (atomic force microscope, AFM), field emission scanning electron microscope (Field Emission Scanning Electron Microscope, FE-SEM) and other methods to observe and explore the waveguide structure, measuring section to light spectrum analysis the optical transmission characteristics of the elements of the instrument and Lightwave measurement system Measurement.

參考文獻


[15]國立中興大學研發處-貴儀中心,場發射掃描式電子顯微鏡原理。
[11] R.Hull, T.chraska, Y.Liu and D.Long,“Microcontact Printing : Nem Mastering and Transfer Techniques for High Throughput,Resoution and Depth of Focus, ”Material Science and Engineering,PP.383-392,2002。
[12] Younan Xia and George M.whitesides;“Soft Lithography”,Angew.Chem. Int.Ed.,37,550(1998) 。
[13]Nishihara Hiroshi, Haruna Masamitsu, Suhara Toshiaki, “Optical Integrated Circuits”, New York : McGraw-Hill Book Co.,2001。
[14]林彥成,2011,“以軟模壓印製程製作光加/去多工元件之研究”,國立虎尾科技大學光電與材料科技研究所。

被引用紀錄


蕭裕韜(2016)。以非對稱波導耦合器製作雙通道濾波元件〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-1608201621524700

延伸閱讀