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  • 學位論文

以非對稱波導耦合器製作雙通道濾波元件

Study of Dual-Chanel filters based on High Asymmetric Bragg Couplers

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摘要


本論文主要以高分子非對稱波導結構分析與探討,以微機電製程技術為基礎,利用黃光微影製程製作波導結構,並將波導結構翻印至高分子材料上,此元件之波導結構分別為粗端和細端組成,再利用全像干涉微影技術製作布拉格光柵於粗端波導底部,而細端則無使其形成非對稱的結構。在製程中填入不同材料於波導結構上,由折射率高的導光層及覆蓋在導光層上低折射率的批覆層構成元件,藉此研究量測的結果。 本研究中,會以原子力顯微鏡(Atomic Force Microscope,AFM)量測繞射光柵之深度、週期及光柵結構3D模擬圖;以場發射掃描式電子顯微鏡(Field Emission Scanning Electron Microscope,FE-SEM)觀察細微波導結構,並採用近場量測技術觀察元件光飽和強度,最後再以可調式雷射Tunable Laser量測光經由光柵反射回擷取端的反射頻譜及輸出端的穿透頻譜。

並列摘要


In this paper, analysis and investigate of polymer waveguide asymmetric structure, in MEMS process technology as the foundation, the use of photolithography process making waveguide structure and waveguide structure reprint onto the polymer material, the waveguide structure of this Device of each coarse end of and the fine end of composition, reuse holographic interference lithography technology to produce a Bragg grating in the crude end of the waveguide at the bottom, and no fine end of to form an asymmetric structure. Filling different materials during the manufacturing process on the waveguide structure, high refractive index of the light guide layer and a light guide layer coated on the low refractive index of cladding layer constituting the elements, whereby the results of the research measured. In this study, using Atomic Force Microscope(Atomic Force Microscope, AFM) to observe element’s diffraction grating depth and period, and 3D rendering of grating structure ; scanning electron microscope(Field Emission Scanning Electron Microscope, FE-SEM) to observe fine waveguide structure, and adopting near-field coupling measurement technique to observe the light saturation intensity, then use Tunable Laser to measure light penetrate through the grating reflection spectrum back to the end of the reflection spectrum and capture the output.

參考文獻


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