本文研究以微機電製程技術為基礎,利用黃光微影製程製作波導通道,再結合軟式微影製程技術中微接觸成型(micro contact printing)、複製成形(replica molding)等技術,利用二甲基矽氧烷(polydimethysiloxane,PDMS)將波導通道複製翻印至高分子材料上,再搭配全像干涉微影技術(Holographic Interference Lithography)其週期可調且大面積製作等優點,製作繞射光柵於波導底部,使波導通道形成一條有光柵,另一條則無的非對稱結構,讓其工作條件符合光塞取多工器工作原理,而利用以上製程技術可達到製程簡單且快速以及價低成本等目的。 在實驗製程中我們會使用場發射掃描式電子顯微鏡(Field Emission Scanning Electron Microscope,FE-SEM)與原子力顯微鏡(atomic force microscope,AFM)觀察其波導結構及繞射光柵深度與週期,最後採用近場量測技術中near-field coupling量測技術來觀察高分子波導反射元件的光飽和強度,並以可調式雷射Tunable Laser做為光源測量波導元件的穿透頻譜與經由光柵影響反射回來的反射頻譜。
This study MEMS technology – based, using the photolithography process to fabricate waveguide channel, combined with soft lithography process technology in micro contact printing and replica molding technology, use of polydimethysiloxane ( PDMS) reprographic copying the waveguide channel to polymer materials, then with Holographic Interference Lithography to cycle adjustable and a large area production, making the bottom of the waveguide diffraction grating, the one waveguide channel have raster, another not of non-symmetrical structure, working conditions in conformity optical drop multiplexer works, then use of the above process technology can achieve the process simple and fast, and low cost price objective. In the experiment, we use the Field Emission Scanning Electron Microscope (FE-SEM) and Atomic Force Microscope (AFM) to observe the waveguide structure and the diffraction grating depth and period, finally using near-field coupling measurement technique to observe the polymer waveguide optical saturation intensity reflective element, then use Tunable Laser as light source and measuring the penetration waveguide grating spectrum and influence is reflected back through the reflection spectrum.