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  • 學位論文

高分子波導之非對稱布拉格反射元件之研究

A study of Asymmetric Polymer Waveguide Couplers with Bragg Reflectors

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摘要


本文研究以微機電製程技術為基礎,利用黃光微影製程製作波導通道,再結合軟式微影製程技術中微接觸成型(micro contact printing)、複製成形(replica molding)等技術,利用二甲基矽氧烷(polydimethysiloxane,PDMS)將波導通道複製翻印至高分子材料上,再搭配全像干涉微影技術(Holographic Interference Lithography)其週期可調且大面積製作等優點,製作繞射光柵於波導底部,使波導通道形成一條有光柵,另一條則無的非對稱結構,讓其工作條件符合光塞取多工器工作原理,而利用以上製程技術可達到製程簡單且快速以及價低成本等目的。 在實驗製程中我們會使用場發射掃描式電子顯微鏡(Field Emission Scanning Electron Microscope,FE-SEM)與原子力顯微鏡(atomic force microscope,AFM)觀察其波導結構及繞射光柵深度與週期,最後採用近場量測技術中near-field coupling量測技術來觀察高分子波導反射元件的光飽和強度,並以可調式雷射Tunable Laser做為光源測量波導元件的穿透頻譜與經由光柵影響反射回來的反射頻譜。

並列摘要


This study MEMS technology – based, using the photolithography process to fabricate waveguide channel, combined with soft lithography process technology in micro contact printing and replica molding technology, use of polydimethysiloxane ( PDMS) reprographic copying the waveguide channel to polymer materials, then with Holographic Interference Lithography to cycle adjustable and a large area production, making the bottom of the waveguide diffraction grating, the one waveguide channel have raster, another not of non-symmetrical structure, working conditions in conformity optical drop multiplexer works, then use of the above process technology can achieve the process simple and fast, and low cost price objective. In the experiment, we use the Field Emission Scanning Electron Microscope (FE-SEM) and Atomic Force Microscope (AFM) to observe the waveguide structure and the diffraction grating depth and period, finally using near-field coupling measurement technique to observe the polymer waveguide optical saturation intensity reflective element, then use Tunable Laser as light source and measuring the penetration waveguide grating spectrum and influence is reflected back through the reflection spectrum.

參考文獻


[13]國立中興大學研發處-貴儀中心,場發射掃描式電子顯微鏡原理。
[6]周錫昌,“應用於光塞取多工器之新型光切換器設計與製造”,碩士論文,國立成功大學機械工程研究所,2003年。
[7]R.Hull, T.chraska, Y.Liu and D.Long,“Microcontact Printing : Nem Mastering and Transfer Techniques for High Throughput,Resoution and Depth of Focus, ”Material Science and Engineering,PP.383-392,2002
[8]Younan Xia and George M.whitesides;“Soft Lithography”,Angew.Chem. Int.Ed.,37,550(1998)
[10]Schmahl.G., and D.Rudolph ,“Holographic diffeaction grating”In: Progress in Optics, E.Wolf, ed., North-Holland, Amsterdam, 14, pp.195,1976

被引用紀錄


丁彥文(2014)。以不同高分子材料覆蓋布拉格光柵之波導非對稱OADM元件〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-0408201418123600
陳佑榮(2014)。具液晶及高分子波導之光塞取多工器之研究〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-0308201419252300
胡家榮(2015)。以非對稱波導填入不同高分子材料製作OADM元件〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-3007201510305300
林柏豪(2015)。具液晶之高分子非對稱布拉格光柵波導元件〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-3007201510201000
蕭裕韜(2016)。以非對稱波導耦合器製作雙通道濾波元件〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-1608201621524700

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