本文主要以高分子非對稱波導結構來探討,以微機電的微加工技術為基礎,將波導結構微小化,並將波導結構製作至高分子材料上,配合此技術將其中一條波導通道遮蔽,接著利用全像干涉微影技術製作布拉格光柵於波導上,形成非對稱的波導結構,並藉由此技術,在具有布拉格光柵段的波導結構中的一小區段加入了高折射率的液晶以擷取出兩個波段為目的。 本文研究中,會以場發射掃描式電子顯微鏡(Field Emission Scanning Electron Microscope,FE-SEM)與原子力顯微鏡(atomic force microscope,AFM)觀察其波導結構及繞射光柵深度與週期,並配合近場量測技術中near-field coupling來觀察光飽和強度,最後以可調式雷射Tunable Laser來測量元件的穿透光譜與反射光譜。
In this paper, a high molecular asymmetric waveguide structure to explore, with MEMS microfabrication technology, miniaturized waveguide structure and waveguide structure to make polymer materials, with this technology will be one of the waveguide channel masking, then use holographic interference lithography technology to produce Bragg grating on the waveguide, formed asymmetric waveguide structure, and by this technique, a Bragg grating having a waveguide structure in a residential section of LCD segments to the high refractive index to retrieve the two bands for the purpose. In this study, will be a field emission scanning electron microscope and atomic force microscopy to observe the waveguide structure and the diffraction grating depth and period, and with the amount of near-field measurement Technology in near-field coupling to observe the light saturation intensity, and finally to tunable lasers to measure the penetration of tunable Laser Spectroscopy and Spectral Reflectance element.