以微模轉印製程及外加電場極化方法在高分子上製作漸變折射率波導

Fabrication of Gradient-Index Polymer Waveguides by Using The Micro-Molding Process with an Applying Electric Field Method

陳昱甫(Yu-Fu Chen)

指導教授 ： 何智廷

共同指導教授 ： 翁豊在

國立虎尾科技大學/工程學院/機械與機電工程研究所/碩士(2012年)

摘要

本研究是以PDMS(Polydimethyl siloxane 聚二甲基矽氧烷)在高分子上製作漸變折射率波導，此研究結合了黃光微影製程(Photolithography)、微模轉印技術(Micro-Molding Process)及外加電場極化方式去做結合。
其製作過程首先我們透過黃光微影製程以負光阻SU-8於玻璃基板上製作波導圖形，再使用PDMS均勻地旋轉塗佈在玻璃基板的模仁之上，接著使用微模轉印方法配合微接觸成形(Micro-Contact Printing)技術與複製成形(Replica Molding)技術將模型(Pattern)轉至OG146(折射率為1.51237)之上，然後在導光層曝光固化的同時外加電場極化的方式改變UV高分子的折射率，製作出漸變折射率波導。
本文經由光學顯微鏡(Optical Microscope, OM) 觀察實驗過程，與稜鏡耦合儀(Prism coupler)以632.8nm 光源量測波導的模態與其折射率，印證為連續式漸變折射率，再以掃描式電子顯微鏡(Scanning Electron Microscope, SEM) 作表面形貌量測，與紀錄實驗之結果，並研究探討。

關鍵字

漸變折射率 ； 波導 ； 微模轉印 ； 電場極化

並列摘要

This project is to study the process by using PDMS to fabricate a polymeric gradient refractive index waveguides structures component along with photolithography, micro molding process and applying electric field method.
First, the negative photoresist SU-8 is used to fabricate waveguides pattern on a glass substrate, and the PDMS is used to transfer on the substrate mold. Next, a micro-molding process by using the Micro-Contact Printing technology & Replica Molding technology are used to pattern on the OG146, and then at core layer the UV exposure is used for curing at same time, the electric field was applied to induce the change of the refractive index of the UV polymer. Finally, UV polymer gradient-index waveguides components is fabricated.
In this study, an optical microscope was used to OM observe experiment process, Prism coupler was used to detect the refractive index of the polymer waveguide, and then profiles of the devices were observed using scanning electron microscope (SEM).

並列關鍵字

GRIN ； waveguide ； micro molding ； electric field

參考文獻

[1] Watanabe, M. Tsuchimori, A. Okada, and H. Ito, “Mode selective polymer channel waveguide defined by the photoinduced change in birefringence”, Appl. Phys. Lett., vol. 71, pp. 750–752, 1997.

[2] S. E. Miller, “Integrated optics：an introduction,” Bell Syst. Tech. J., vol. 48, pp. 2059-2068, 1969.

[3] K. O. Hill, Y. Fujii, D. C. Johnson, and B. S. Kawasaki “Photosensitivity in Optical Fiber Waveguides：Application to Reflection Filter Fabrication” Applied Physics Letter, Vol. 32, pp. 647-649, 1978.

[4] B. E. A. Saleh and M. C. Teich, Fundamentals of Photonics, Weily, 1991.

[5] Low-loss and thermally stable TE-mode selective polymer waveguide using photosensitive fluorinated polyimide Jae-Wook Kang;Jang-Joo Kim;Xiangdan Li;Myong-Hoon Lee;Photonics Technology Letters, IEEE, Volume:14, Issue:9, Sep 2002