本研究是以微機電系統(Micro-Electro-Mechanical System, MEMS)技術配合光學全像干涉微影(Holographic Interference Lithography)技術製作繞射光柵模仁(Diffraction Grating mold insert),再以此繞射光柵模仁配合黃光微影製程製作柵輔式光波導模仁。 製程中先以光學全像干涉微影與黃光微影製程製作繞射光柵元件,將此一元件配合微機電技術之電鑄(Electroforming)製程製作出繞射光柵金屬模仁;並且以此繞射光柵元件配合軟性印刷(non-photolithographic)技術之微接觸成形(micro-contact printing )、毛細管成形(micromolding in capillaries)與複製成形(replica molding)技術製作高分子繞射光柵模仁。 再者,利用高分子繞射光柵模仁配合黃光微影製程之厚膜光阻製程與軟性印刷技術,製作高分子柵輔式波導模仁;研究中以原子力顯微鏡、掃描式電子顯微鏡與光學量測等方法觀察與紀錄實驗之結果,並研究探討。
In this thesis, we developed two novel techniques in fabricating the diffraction and reflection grating fabrication, the electroforming technique, incorporating with the holographic interference technology, was used to produce high aspect ratio gratings. For the diffraction grating fabrication, the stamping transfer technique, incorporated with holographic interference technology, was used to transfer the grating from soft rubber mold to the OG polymer mold. The diffraction efficiency shows that good diffraction effect can be obtained Furthermore ,the grating assisted coupler molds with two and three guides were successfully fabricated in terms of the above grating molds with stamping transfer techniques. Good results were observed using SEM and AFM system.