ITO圖案化對LED晶粒之取光特性分析

本研究針對藍光LED晶粒進行ITO圖案化與粗化製程，並探討其對光萃取量的影響。首先設計三組不同圖案光罩分別用於(1)定義工作區域(2)圖案化蝕刻(3)電極製作等三道黃光製程。其次將LED晶片進行黃光、蝕刻、薄膜、合金、沉積、粗化等製程，其中將銦錫氧化物(Indium Tin Oxide ITO)的厚度控制為120nm與260nm兩種，進行溼蝕刻開孔洞製程，分析圖案化對光輸出之影響，粗化製程係以ITO蝕刻液控制在40℃，粗化時間以每間隔5秒取樣一次至25秒為止，藉以分析未粗化與粗化後光萃取量的變化關係。

關鍵字

LED ；晶粒製程；蝕刻技術； ITO圖案化；粗化技術

並列摘要

In this study, the blue ray LED grains are used to conduct the ITO patterning and coarsening process, and the effect of it on the light extraction amount. First, the three reticles with different patterns are respectively used to (1) define the work area, (2) pattern etching, and (3) produce electrode in the three yellow ray processes. Secondly, the LED chips are conducted with the process of the yellow-ray, etching, thin film, alloy, and deposition, in which the thickness of the Indium Tin Oxide ITO is controlled into 120nm and 260nm to conduct the wet etching open-hole process to analyze the effect of patterning on light output. In the coarsening process, the ITO etching solution is controlled at 40℃and the interval of the coarsening time is every 5 seconds for total 25 seconds, so as to analyze the light extraction change relationship after un-coarsening and coarsening.

並列關鍵字

LED ； chip process ； ETCH techniques ； ITO patterning ； coarsening techniques

參考文獻

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國際替代計量

ITO圖案化對LED晶粒之取光特性分析

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