本研究探討氧化鋅奈米柱應用於發光二極體元件(LED)及場效電晶體(FET)上,單晶氧化鋅(ZnO)奈米柱陣列製備方法採用低成本、低溫的水熱法。首先在經表面改質且無晶種層的p+-Si基板上形成自組裝薄膜,以水熱法來成長氧化鋅奈米柱陣列。氧化鋅奈米柱陣列藉由高解析度X -射線繞射(HRXRD)、場發射掃描電子顯微鏡(FESEM)和光激發螢光光譜(PL)分析其材料特性。藉由FESEM和XRD發現經過表面改質的p+-Si可成長出高均向性一維氧化鋅奈米柱陣列,形成的n-ZnO nanorods/p+-Si的異質結構製作成短波長發光二極體元件,其討論電流-電壓(I-V)特性曲線及電激發光光譜(EL)來觀察n-ZnO nanorods/ p+-Si元件的光電特性。PL與EL分析顯示出氧化鋅奈米柱具有紫外光和可見光發光區域。為了獲得單一根氧化鋅奈米柱傳導特性,將製作單一氧化鋅奈米柱場效電晶體,經由電晶體操作模式判斷氧化鋅奈米柱為n-type半導體材料,其載子移動率為62.33 cm2/Vs、載子濃度為6.868×1014 cm-3、電阻率為1.46×102 Ω-cm。
In this study, the zinc oxide nanorods arrays were applied in light emitting diodes (LED) and field effect transistors (FET). The single crystalline Zinc oxide (ZnO) nanorods array was synthesized on p+-Si substrate without seed layer using the low-cost and low- temperature hydrothermal method. The substrate surface was functionalized by hydrofluoric acid (HF) and self-assembled monolayer of octadecyltrimethoxysilane [(CH3 (CH2)17Si (OCH3)3, ODS]. ZnO nanorods were characterized by high-resolution x-ray diffraction (HRXRD), field emission scanning electron microscopy (FESEM), and photoluminescence (PL). The results of FESEM and XRD indicated that the functionalized surface of p+-Si employed for grown the high-isotropic one-dimensional zinc oxide nanorods arrays was possible. We also report that the fabrication and electroluminescence (EL) of an n-ZnO nanorods/p+-Si heterostructure light emitting diodes. The current - voltage (I-V) and EL characteristics of the photo-electrical characteristics LED devices were observed. The photoluminescence (PL) and EL spectrum show a ultraviolet peak and a visible light emission. The fabrication and characteristics of single ZnO nanorod field-effect transistors (FET) were been done. The ZnO nanorod in this study was n-type semiconductor material determined by FET operation mode. The single ZnO nanorods field effect transistor possesses the electron mobility, electron concentration and resistivity of 62.33 cm2/Vs, 6.868×1014 cm-3, and 1.46×102 Ω-cm, respectively.