- 學位論文
奈米級雷射直寫平台之研製
Development of Laser Direct Writing Equipment of Nano Stage
摘要
本論文主要針對於奈米級雷射直寫平台，在組裝、校正方面制定一個標準化作業流程（Standard Operating Procedure）及進行機台系統整合與控制，最後整合藍光雷射系統進行刻寫驗證機台性能。本機台包含三大部分: (1)兩段式長行程奈米級精密定位平台系統(2)三自由度雷射干涉儀回授量測系統(3)FPGA對位介面及藍光雷射直寫系統。 其中兩段式長行程奈米級精密定位平台系統由H型長行程氣浮式線性馬達平台與奈米級壓電平台組合而成。H型長行程氣浮式線性馬達平台用於X軸長行程快速掃瞄、定位與Y軸步進定位，奈米級壓電平台則用於補償平台X軸與Y軸移動時所造成的定位誤差與θz角度誤差。 三自由度雷射干涉儀回授量測系統包含了雷射干涉儀與光學鏡組，用於測量平台移動時的位置及誤差，且兩段式長行程平台的回授系統係使用雷射干涉儀。 FPGA對位介面經由量測系統傳送平台位置訊號，並於預定刻寫位置傳送觸發訊號給藍光雷射直寫系統，使藍光雷射直寫頭刻寫出不同的排列組合，如四角晶格、三角晶格、六角晶格。
並列摘要
This research project in title of “Laser Direct Writing Processing Equipment for Periodic Nanostructure Pattern” integrated the technologies of the hybrid long-stroke precision nano-stage design, the multi-DOF heterodyne interferometer feedback control system, and the novel laser direct writing lithography instrument. The hybrid long-stroke multi-axis precision nano-stage formed by an H-type long-stroke nano-stage and a nano piezo-stage. The multi-DOF heterodyne interferometer feedback control system uses dual-frequency laser interferometer for the measurement of X and Y axis position and θz angle error of the nano-stage. The ovel laser direct writing lithography instrument includes blue laser direct writing head, FPGA interface and servo control main board. Finally, the system integration and relevant tests have been completed as well. This equipment have been working to generate increase writing speed, precision and range. In this research, the integration of the Laser Direct Writing Processing Equipment can improve the process speed, precision and range, overcome the optical limit of interference to reduce the writing spot, generate arbitrary patterns, and cut down the equipment cost.