In this thesis, we will investigate the structure of the double-gate MOSFETs. This structure has the following advantages: better short channel effect, low power consumption, good gate-channel control capability, better current driving force, the lower channel leakage current and near ideal sub-threshold swing, etc. Then we design a 2-D device simulator to investigate the device characteristics of the double-gate MOSFET. We analyze the Id-Vg curves of the double gate and single-gate components, sub-threshold swing difference in the different channel length, and double-gate leakage current in the different thickness of the bulk silicon. Finally, we use the threshold voltage formula to verify the validity of the 2-D device simulator,and then analyze the impact of the various design parameters.