本研究所使用的鈷鐵硼靶材其組成的成份分別為Co40Fe40B20以及Co60Fe40B20,利用直流磁控濺鍍機分別濺鍍於玻璃基板上,其膜厚參數控制為25 Å至200 Å。接著進行各項性質的量測研究。 由XRD (X-ray diffractometer)量測結果得知,Co40Fe40B20以及Co60Fe20B20的薄膜試片其結晶狀態都為非晶質(Amorphous)。接著藉由DSC (Differential Scanning Calorimeter)的量測下得知Co40Fe40B20以及Co60Fe20B20的各項熱性質參數,如玻璃轉換溫度(Glass transition temperature, Tg)以及結晶溫度(Crystalline Temperature, Tx)等,利用這些數值可以得知非晶質鈷鐵硼薄膜的玻璃形成能力(Glass Forming Ability, GFA),此為一重要參考指標。接著再利用Kissinger formula計算得知Co60Fe20B20這組薄膜在膜厚75 Å時所計算出來的活化能值為最高,也表示結晶能力最差,也意味著其抗結晶能力高。而Co40Fe40B20這組薄膜在相同的膜厚下,其活化能為最低,這與前者的結果大不相同,故可以推論鈷或者鐵的含量多寡,對影響其活化能的高低佔有很大的關係,也可以得知膜厚75 Å為一個臨界厚度。接著再對於非晶質鈷鐵硼薄膜,改變膜厚對於其電性、光性以及其表面能會有何影響來作進一步的探討。
This examine we have two target with Co40Fe40B20 and Co60Fe20B20, and deposit monolayer Co40Fe40B20 and Co60Fe20B20 thin film on glasses substrate by dc magnetron sputtering with the thickness from 25 Å to 200 Å, respectively. The structure of Co40Fe40B20 and Co60Fe20B20 thin films were amorphous by using XRD (X-ray diffractometer). The thermal properties of Co40Fe40B20 and Co60Fe20B20 thin films were measured by DSC (Differential Scanning Calorimeter). The thermal properties are studied by DSC such as Glass transition temperature (Tg), Crystalline Temperature (Tx), glass forming ability (GFA) are calculated by these values. This is an important value. By the calculation of Kissinger formula, the activity energy of the Co60Fe20B20 and the thickness of 75 Å is the highest. It shows the crystallization is the lowest. It also means it is more anti-crystallization. However, the energy of 75 Å-Co40Fe40B20 thin films is the lowest that is opposite to the result of Co60Fe20B20. This phenomenon can reasonably associate with the concentration of Co or Fe, and affect energy. According to the result, the thickness of 75 Å is a critical thickness. This study also investigated the amorphous CoFeB thin film to determine their electrical, optical and surface energy properties, and further discussion.