銅摻雜氧化鎳薄膜之結構、表面特性及機械性質研究

Effects on the Structural, Surface Morphological and Nanomechanical Properties of Cu-doped NiO Thin Films

王三和(San-Ho Wang)

指導教授 ： 簡賸瑞

義守大學/工學院/材料科學與工程學系/博士(2022年)

摘要

本研究使用射頻磁控濺射法沉積銅摻雜氧化鎳薄膜於玻璃基板上，透過不同退火溫度來分析探討銅摻雜氧化鎳薄膜之微結構、表面形貌與奈米機械性質。
X光繞射(XRD)結果顯示：沉積後的銅摻雜氧化鎳薄膜主要由優選方向(200)方向晶粒組成，當退火溫度從300℃逐漸增加至500℃，會促使薄膜更為等軸多晶結構，其(111)、(200)及(220)繞射峰強度變強，半高寬變窄，使銅摻雜氧化鎳薄膜的結晶度增加，晶粒尺寸變大。另外，從原子力顯微鏡與表面接觸角觀察薄膜表面形貌結果顯示：表面粗糙度與表面接處角皆退火溫度升高而增加。薄膜表面粗糙度從0.7nm增加至3.8nm；接觸角則從45.7°增加至97.5°，表示退火溫度的升高將趨使銅摻雜氧化鎳薄膜表面越傾向於疏水特性。另一方面，亦利用連續勁度量測技術之奈米壓痕儀，量測銅摻雜氧化鎳薄膜之奈米機械性質。奈米壓痕實驗結果顯示：隨著退火溫度升高，銅摻雜氧化鎳薄膜之硬度從15.4 GPa增加至25.2 GPa，楊氏模數則從149.6 GPa增加至206.5 GPa。說明了此薄膜之硬度與晶粒尺寸符合“Inverse Hall-Patch”關係式，意指著應變狀態或晶界會影響薄膜的奈米機械性質。

關鍵字

銅摻雜氧化鎳 ； X光繞射儀 ； 表面能 ； 奈米壓痕 ； 硬度

並列摘要

In this study, the effects of annealing temperature on the structural, surface morphological and nanomechanical properties of Cu-doped (Cu-10at%) NiO thin films (CNO) deposited on glass substrates by using radio-frequency magnetron sputtering are investigated. The X-ray diffraction (XRD) results indicated that the as-deposited CNO thin films were predominantly consisted of highly defective (200)-oriented grains, indicating that the broadened diffraction peaks. Progressively increasing the annealing temperature from 300C to 500C appeared to drive the films into more equiaxed polycrystalline structure with much enhanced film crystallinity, as were manifested by the increased intensities and much narrower peak widths of (111), (200) and even (220) diffraction peaks. The changes in the film microstructure appeared to result in significant effects on the surface energy, in particular the wettability, of the films as revealed by the X-ray photoelectron spectroscopy and the contact angle of the water droplets on the film surface. The nanoindentation tests carried out with the continuous contact stiffness measurements mode revealed that both the hardness and Young’s modulus of CNO thin films are increased with increasing annealing temperature. The hardness (Young’s modulus) of CNO thin films are increased from 15.4 (149.6) GPa to 25.2 (206.5) GPa with increasing the annealing temperature from 300oC to 500oC. The nanoindentation tests further revealed that the mechanical properties of CNO thin films increased with the annealing temperature, suggesting that the strain state and/or grain boundaries may have played a prominent role in determining the films nanomechanical characterizations.

並列關鍵字

Cu‐doped NiO thin films ； XRD ； Surface energy ； Nanoindentation ； Hardness

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