低溫電漿技術製備含碳氧化鈦膜及光觸媒親水特性

The Preparation of Organic containing Titanium Oxide Film by Cold Plasma and Its Photocatalytic Hydrophilic Property

劉佩瑜(Pei-Yu Liu)

指導教授 ： 陳克紹

大同大學/工程學院/材料工程學系所/碩士(2004年)

摘要

TiO2因其為具有強大氧化還原能力的半導體，而成為最廣泛使用的光觸媒材料。TiO2 有防霧、淨化、除臭、及殺菌等光觸媒功能。本實驗以低溫電漿氧氣前處理高分子或Si-wafer基材，活化基材使表面有－OH、－COOH等自由基，再spin coating 上Sol-gel法製成之含鈦溶液Ti(OR)4，最後用氧氣低溫電漿氧化Ti及分解有機物使成鈦氧化物，期待其具有光觸媒功能。研究發現基材表面經氧氣電漿處理會增加其粗糙度及親水性。有助於有機鈦溶液的塗佈，塗佈後再以電漿氧化可於基材表面得含鈦氧化膜。隨著氧氣電漿處理瓦數及時間增加, 含鈦氧化膜之-CH鍵會減少而Ti-O及C-O鍵等會增加，氧氣電漿處理會去除表面有機物而形成鈦氧化物。表面氧氣處理瓦數及時間增加，使所得含鈦氧化膜由疏水漸變親水。含鈦氧化膜經照UV光，會提升其親水性，約60分鐘後，水接觸角可從60度降為10度。

關鍵字

光觸媒 ； 電漿

並列摘要

Titanium dioxide (TiO2) is the well-known photocatalyst material; there is a wide range of potential applications of TiO2 for the purification of environmental air and water, deodorization, and antibacterial and self-cleaning coating. In order to develop a low temperature process; the substrates were pre-treated by oxygen plasma activated procedure, and then spin coating of Ti (OR) 4 precursor solution was carried out to prepare Ti-containing organic films. Finally, O2 plasma was employed to decompose organic compounds and oxidize Ti to form oxides. The effect of power, pressure, and post oxygen plasma treatment on the chemical structure and composition of the film will be investigated.
PET and Si-wafer were used as substrates. O2 plasma pretreatment can improve the wettability. From the observation of AFM and SEM, the substrates treated by O2 plasma develop more roughness and hydrophilic surface. Plasma pretreated substrates improve adhesion of Ti (OR) 4 precursor. Oxygen plasma post treatment can oxidize the organic compounds to form titanium oxide carbon this surface subsequently. From the analysis IR and ESCA, we can observe that O2 plasma treatment decrease –CH bond and increase Ti-O, C-O bonds. Their surface hydrophilic was enhanced by UV-irradiation, the degree of water contact angle decreased from 60 to 10.

並列關鍵字

photocatalytic ； plasma

參考文獻

[4] T.Nitta, Z.Terada, s. Hayakawa, Humidity-sensitive electrical conduction of MgCrO4-TiO2 porous ceramics, J. Am. Ceram. Soc. 63 (1980) 295-300

[6] L.L.W.Chow, M.M.F.Yuen, P.C.H.Chan, A.T.Cheung, Reactive sputtered TiO2 thin film humidity sensor with negative substrate bias, Sens & Actuators B76 (2001) 310-315.

[7] A. Tuan, M. Yoon, V. Medvedev, Y. Ono, Y. Ma, J. W.Rogers Jr., Interface control in the chemical vapor deposition of titanium dioxide on silicon (1 0 0), Thin Solid Films 377/378 (2000) 766-771

[8] B-C.Kang, S-B.Lee, J. -H.Boo, Growth of TiO2 thin films on Si- (1 0 0) substrates using single molecular precursors by metal organic chemical vapor deposition, Surf. Coat. Technol. 131 (2000) 88-92.

[10]Xiao-Lin Wanga*, Jian Huangb, Xiu-Zhen Chen”, Xue-Hai Yub，Graft polymerization of N-isopropylacrylamide into a microporous polyethylene membrane by the plasma method:technique and morphology，Desalination 146 (2002) 337-343。