以磁控濺鍍法沈積氧化鈦薄膜的光學性質之研究

The Investigation for Optical Properties of Titanium Oxide Films Prepared by Magnetron Sputtering

吳定錕(Ding-Kun Wu)

指導教授 ： 林素霞

共同指導教授 ： 李佩君

國立暨南國際大學/科技學院/電機工程學系/碩士(2008年)

https://doi.org/10.6837/NCNU.2008.00342

摘要

氧化鈦(TiO2)薄膜是被廣泛研究的光學薄膜，在光學元件上也有相當多的應用。TiO2薄膜的性質深受其製備方法和製備參數的影響，為了在低溫製程裡，獲得品質佳的TiO2光學薄膜，本研究使用射頻磁控濺鍍法來沈積TiO2薄膜，並同時採用射頻(RF)濺射TiO2靶材及直流(DC)濺射鋁靶材進行混鍍，進行摻雜Al於TiO2薄膜(TiO2：Al)的披覆，探討射頻功率、直流功率、氬氣壓力、氧氣/氬氣比率及薄膜厚度對TiO2及TiO2：Al薄膜之光學性質的影響。實驗結果顯示，藉由Al的摻雜，可以提升TiO2薄膜在可見光-紅外光區的穿透率。

關鍵字

氧化鈦 ； TiO2：Al ； 射頻磁控濺鍍法 ； 直流磁控濺鍍法 ； 光學性質

並列摘要

Titanium oxide (TiO2) films were investigated by many people, and were used in optical devices. The characteristics of TiO2 films were strongly affected by the preparation conditions and experimental parameters. In order to obtain good optical films at low substrate temperature, TiO2 films were deposited by RF magnetron sputtering in this study. The TiO2 films were doped with Al (TiO2：Al) by simultaneous RF magnetron sputtering of TiO2 and DC magnetron sputtering of Al. The effects of RF power, DC power, Ar pressure, the ratio of O2 to Ar pressure and film thickness on the optical properties of TiO2 and TiO2：Al films were investigated. The results indicated that the transmission in the VIS-IR region of TiO2 films could be improved by doping Al.

並列關鍵字

titanium oxide ； TiO2：Al ； RF magnetron sputtering ； DC magnetron sputtering ； optical properties

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