電漿疏水化表面改質技術應用在彩色濾光片噴墨印刷之研究

Hydrophobic Surface Modification by Plasma Treatment for the Ink-jet Printing of Color Filter

許勝翔(Sheng-Hsiang Hsu)

指導教授 ： 陳克紹

大同大學/工程學院/材料工程學系所/碩士(2007年)

摘要

表面改質技術中以電漿活化處理可得改質表面均勻及功能性等特點，又以電漿活化處理方式及表面接枝聚合所製成的薄膜特性尤佳。藉電漿處理後表面形成的自由基或是特性官能基，改善玻璃基材之親水性，例如使用氧氣電漿處理能提升親水性，而六甲基二矽氨烷(HMDSZ)、CF4電漿處理則能提升材料表面疏水性質。本研究將透過結合電漿改質的處理加上黃光微影技術的方法，此種方法增進基材對噴墨色料之附著性。此研究重點在於找出適合的電漿處理過程以及參數，以期增進基材與光阻的附著性，並探討不同電漿處理材料表面的化學型態，改質其親疏水性，藉以開發利用噴墨技術來製備出彩色濾光片。玻璃與黑色矩陣層經全氟甲基環己烷表面電漿沉積處理後，能有效降低基材對彩色光阻的附著(接觸角由<10o提升到50o)，另外由紅外線光譜分析， 1140~1188cm-1附近出現CF2的特定峰，ESCA分析也証明改質上含F化物。含F電漿改質後試片經過UV光照射或氧氣電漿的後處理，能恢復對RGB光阻的附著性(接觸角<10o)，利用此結果可設計出噴墨製備彩色濾光片的電漿改質流程。

關鍵字

彩色濾光片 ； 電漿處理 ； UV光接枝聚合 ； 玻璃基材

並列摘要

The color filter on mantling the photo resist of the red, green, and blue colors is an important element of LCD, that becomes colorful images at eye when the source of light across the filter forms the red, green, and blue rays. If we use the inkjet technology to make the color filter it is crucial one of the technique that control the location of the drop of inkjet, and how to improve the adherence of the surface of glass matrix to the drop of inkjet. At the skill of improving the surface the active plasma is able to be uniform, as well as functional. Plasma activation treatment and polymerization can achieve high quality of adhesiveness and coverage of nanometer-scaled thin film. After plasma treatment, sample surface will be produced radicals and functional groups. That can improve the adhesion of ink. This study will combine plasma modification technique and photolithography process; plasma treatment technique and grafting polymerization technique to give sample surface hydrophilic groups. These two ways are able to improve adhesion of ink on the color filter. Glasses and Black Matrix after Perfluoromethylcyclohexane (PFMCH) plasma treatment have good surface hydrophobic property. Contact angle of photo color filter resist solution on sample raise from <10o to 50o. And then post treatment by O2 plasma and UV-light irradiated could reduce wettability of photo resist solution (contact angle <10o). Then we could find the way of how to control and apply for plasma, as well as the parameters; at the same time we wish to increase cover between glass matrix and colored materials to develop new, effective, and useful filter by the method inkjet tecknology. To solidify the color effectively, and to decrease the amount of the color, and to keep off the mix of the color, we also want to improve the yield of color filter.

並列關鍵字

Color Filter ； plasma treatment ； UV-light-grafted polymerization ； Glass substrate

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