抗反射膜之模擬與製作及其在太陽電池之應用

Simulation and fabrication of antireflection coatings for solar cell application

陳俊維(Jun-wei Chen)

指導教授 ： 施文欽

大同大學/電機資訊學院/光電工程研究所/碩士(2007年)

摘要

抗反射薄膜已經成為矽晶太陽能電池的製程關鍵步驟之ㄧ，其可降低光的反射，進而增加入射光。本論文主要是利用光學模擬軟體Film Star來模擬抗反射薄膜之特性，再用射頻磁控濺鍍法成長二氧化矽和氮化矽薄膜在Si 基板，接著將兩種薄膜做光學厚度不同的堆疊，在可見光範圍下獲得反射率的降低。
在單層抗反射膜的部份，SiO2和Si3N4在λ/4的最低反射率分別為4.76 %、0.34 %，其將拋光的矽晶片的反射率降低74.94 %和82.04 %；雙層抗反射膜在λ/4-λ/4的平均反射率為8.39 %，則是將矽晶片的反射率降低77.70 %。期望可將抗反射膜應用在太陽電池上，以降低反射率，而增加太陽電池之效率。

關鍵字

抗反射膜 ； 濺鍍 ； 太陽電池

並列摘要

Antireflection coatings have been the key of the fabricated silicon solar cells; they can reduce the reflection and increase the light. This study used the Film Star software to simulate the characteristic of the antireflection coatings. Using rf magnetron sputtering deposit SiO2 and Si3N4 film on the silicon substrate, and we will aim at different optical thickness stacking. We wish get the lower reflection at vision region.
The part of single layer ARC, the lowest reflection of SiO2 and Si3N4 is 4.76 % and 0.34 % at λ/4 optical thickness. Their reflection will compare low 74.94 % and 82.04 % with polish silicon wafer. The average reflection of double layer ARC is 8.39 % at λ/4-λ/4 optical thickness, and it will reduce 77.70 %. We wish we can let the antireflection coating combine with the solar cells, and reduce the reflection and increase the efficiency of the solar cells.

並列關鍵字

antireflection ； sputter ； solar cell

參考文獻

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