運用實驗計畫法改善彩色濾光片黑色矩陣製程白欠陷

Using Design of Experiment Approach to Improve BM Lost Ratio of Color Filter Black Matrix Process

盧嘉隆(Chia-Lung Lu) ； 溫武義(Wu-Yih Uen)

《先進工程學刊》 5卷4期 (2010/10) Pp. 385-389

https://doi.org/10.29948/JAE.201010.0013

摘要

彩色濾光片(Color Filter, CF)黑色矩陣(Black Matrix, BM)製程在生產過程中會因為白欠陷(BM lost)影響產品良率，為了降低因為BM lost造成報廢影響到TFT-LCD的生產成本，本研究利用實驗計畫法(Design Of Experiment, DOE)找出造成黑色矩陣白欠陷的顯著因子，再進一步找出降低黑色矩陣白欠陷的最佳製程參數。以實驗計劃法專案管理的流程進行改善，其結果顯示彩色濾光片的關鍵製程有明顯改善，且最佳條件組合不但使不良率降低，品質和製程能力提升，且使製程更加穩定。

關鍵字

彩色濾光片 ； 黑色矩陣 ； 白欠陷 ； 實驗計劃法

並列摘要

Black matrix (BM) process of color filter (CF) will reduce the yield because of the presence of defects of BM lost. To reduce the scrap of BM lost that affects the cost of TFT-LCD, we used Design of Experiment (DOE) method to identify significant factors that cause BM lost. Further, we obtained the optimum processing parameters from the experimental results to reduce BM lost. It has been found that using the DOE approach with the optimum parameters would greatly improve both the processing capability of CF manufacturing and the conforming rate of the color image in display.

並列關鍵字

color filter ； black matrix ； BM lost ； design of experiment