In this study, we try to fabricate surface texture on (100) silicon wafer in KOH alkaline solution by anisotropic etching. Successfully, the weight reflectivity is reduced from 29.6% to 15.3% with surface texture. Then, we use thermal oxidation and soak BOE to lower the sharpness of pyramids and it achieved. However, it slightly affects the reflectivity reduce. After growing 0.5μm SiO_2 and etching the weight reflectivity is 17.7%.