應用基因演算法於半導體製程控制之研究－以化學機械研磨為例

Genetic Algorithm Based Semiconductor Manufacturing Process Controller for Chemical Mechanical Planarization

葉進儀(Jinn-Yi Yeh) ； 黃寶賢(Bau-Hsien Huang)

《工業工程學刊》 20卷6期 (2003/11) Pp. 625-635

摘要

本研究提出一個可用於半導體製程的run-to-run(R2R)多輸入多輸出控制器，名為基因演算法品質控制器(Genetic Algorithm Quality Controller, GAQC)，其中遞迴估計技術用來估計Hammerstein類型模式的參數，而實數型基因演算法(real-valued geneticalgorithm, RVGA)則用來獲得下一次執行的近似最佳解，在測試方面，以SEMATECH所提供的實際製程設備模式為基礎的化學機械研磨製程來作為模擬的對象，經由實驗結果顯示在不同大小干擾與偏移的存在下，即使輸入及輸出轉換函數為非線性的狀態時，GAQC系統能保持適應性的反應控制，且效能及效率上均優於最佳適應品質控制器(Optimizing Adaptive Quality Controller, OAQC)及多變量自適應控制器(MultivariateAdaptive Controller, MAC)。

關鍵字

R2R控制器 ； 實數型基因演算法 ； 化學機械研磨

並列摘要

This research presents a run-to-run (R2R) multiple input-multiple output (MIMO) controller, termed Genetic Algorithm Quality Controller (GAQC), for semiconductor manufacturing processes. A recursive least-squares algorithm is used to estimate the parameters of the Hammerstein MIMO model. A real-valued genetic algorithm (RVGA) is applied to obtain the near optimal solution for the next run. The simulation is conducted for Chemical Mechanical Planarization (CMP) processes based on real models provided by SEMATECH. Experimental results show that GAQC outperforms Optimizing Adaptive Quality Controller (OAQC) and Multivariate Adaptive Controller (MAC) under the presence of noise and drift disturbances of different magnitudes; meanwhile, GAQC maintains adequate removal rate and nonuniformity under severely nonlinear input/output transfer functions.

並列關鍵字

run-to-run controller ； real-valued genetic algorithm ； chemical mechanical planarization

參考文獻

Adewuya, A.(1996).New Methods in Genetic Search with Real-valued Chromosomes.Cambridge, MA:Mechanical Engineering Department, Massachusetts Institute of Technology.

Boning, D.,Moyne, W.,Smith, T.,Moyne, J.,Hurwitz, A.(1995).Proceedings of the sixth annual SEMI/ IEEE advanced semiconductor manufacturing conference.

Butler, S. W.,Stefani, J. A.(1994).Supervisory run-to-run control of a polysilicon gate etch using in situ ellipsometry.IEEE Transactions on Semiconductor Manufacturing.7(2)

Clarke, D. W.,Gawthrop, P. J.(1975).Self tuning controller.IEE Proceedings: D, Control Theory and Applications.122(9)

Del Castillo, E.(1996).A multivariate self-tuning controller for run-to-run process control under shift and trend disturbances.IIE Transactions.28(12)