- 期刊
使用攜帶式X-ray螢光偵測儀監測微電子業維修作業環境中之砷暴露
Use of Portable X-Ray Fluorescence (PXRF) in Monitoring Arsenic Exposure during the Preventive Maintenance Task in the Microelectronic Industry
摘要
Potential high level arsenic exposure during preventive maintenance work in the microelectronics industry has been of great concern in recent years. Portable X-ray fluorescence (PXRF), which has the advantages of convenience and speed, is one of the best choices for on-site arsenic monitoring. The purpose of this study is to evaluate the efficacy of PXRF use in monitoring arsenic exposure for workplaces that use arsenic-based compounds as raw materials. Twenty-one standard arsenic wipe samples ranging from 5 to 5,000 μg/sample and 16 standard mixed wipe samples, with arsenic levels of 20 to 1,000 μg/sample and gallium levels of 50 to 750 μg/sample, were prepared for examination. In addition, sixty-one field samples were collected during a preventive maintenance task for molecular beam epitaxy and metal organic chemical vapor deposition in a gallium arsenide wafer plant. All the standard and field wipe samples were first analyzed by PXRF and then by inductively coupled plasma mass spectrometry (ICP-MS). The ICP-MS measurement was used as a standard to evaluate the performance of the PXRF measurement. Samples with an arsenic content less than 25 to 50 μg/sample tended to be overestimated by PXRF, while those with higher arsenic content were always underestimated with relative errors ranging from 10% to 25%. The detection limit and quantification limit for the PXRF arsenic measurement were 4.8 μg/sample and 16.1 μg/sample respectively. For arsenic content higher than 50μg/sample, variation coefficients of the PXRF measurements were all less than 5%. Arsenic content in all types of field wipe samples ranged widely from 2.5 to 57,000 μg/sample, with a geometric mean of 864.4 μg/sample (GSD=8.5). The highest arsenic exposure was found at the preventative maintenance working site (p＜0.0001). A high correlation r=0.978 (p＜0.0001) was observed between PXRF and ICPMS arsenic measurements. PXRF arsenic measurements might be biased by the co-existence of gallium and constrained by resolution width. Nevertheless, based on the aforementioned high correlation between PXRF and ICP-MS arsenic measurements, PXRF still yields a fairly reliable real time relative arsenic exposure for the purpose of on-site exposure monitoring, with a range from the PXRF quantification limit for arsenic of 16.1 μg/sample to the highest arsenic content in this study of 57,000 μg/sample.
並列摘要
Potential high level arsenic exposure during preventive maintenance work in the microelectronics industry has been of great concern in recent years. Portable X-ray fluorescence (PXRF), which has the advantages of convenience and speed, is one of the best choices for on-site arsenic monitoring. The purpose of this study is to evaluate the efficacy of PXRF use in monitoring arsenic exposure for workplaces that use arsenic-based compounds as raw materials. Twenty-one standard arsenic wipe samples ranging from 5 to 5,000 μg/sample and 16 standard mixed wipe samples, with arsenic levels of 20 to 1,000 μg/sample and gallium levels of 50 to 750 μg/sample, were prepared for examination. In addition, sixty-one field samples were collected during a preventive maintenance task for molecular beam epitaxy and metal organic chemical vapor deposition in a gallium arsenide wafer plant. All the standard and field wipe samples were first analyzed by PXRF and then by inductively coupled plasma mass spectrometry (ICP-MS). The ICP-MS measurement was used as a standard to evaluate the performance of the PXRF measurement. Samples with an arsenic content less than 25 to 50 μg/sample tended to be overestimated by PXRF, while those with higher arsenic content were always underestimated with relative errors ranging from 10% to 25%. The detection limit and quantification limit for the PXRF arsenic measurement were 4.8 μg/sample and 16.1 μg/sample respectively. For arsenic content higher than 50μg/sample, variation coefficients of the PXRF measurements were all less than 5%. Arsenic content in all types of field wipe samples ranged widely from 2.5 to 57,000 μg/sample, with a geometric mean of 864.4 μg/sample (GSD=8.5). The highest arsenic exposure was found at the preventative maintenance working site (p＜0.0001). A high correlation r=0.978 (p＜0.0001) was observed between PXRF and ICPMS arsenic measurements. PXRF arsenic measurements might be biased by the co-existence of gallium and constrained by resolution width. Nevertheless, based on the aforementioned high correlation between PXRF and ICP-MS arsenic measurements, PXRF still yields a fairly reliable real time relative arsenic exposure for the purpose of on-site exposure monitoring, with a range from the PXRF quantification limit for arsenic of 16.1 μg/sample to the highest arsenic content in this study of 57,000 μg/sample.
參考文獻
延伸閱讀
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