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不同有機材料保護層對a-IGZO TFT影響探討

Electrical Characteristic on a-IGZO Thin-Film Transistors with Organic Materials as Passivation Layers

摘要


在本研究中,使用直流濺鍍(DC Sputter)的方式沉積氧化銦鎵鋅薄膜(Indium-Gallium-Zinc-Oxide, IGZO),在薄膜上旋塗不同的有機材料作為保護層(Passivation Layer),探討保護層對元件特性造成的影響,發現臨界電壓(Threshold Voltage, V(下標 th))均會向左飄移、次臨界擺幅(Sub-threshold Swing, S.S)提升、飽和電流(Saturation Current)下降、電子遷移率(Mobility)下降,並推斷當有機材料內的水與有機溶液接觸到主動層造成破壞導致電性下降,並發現使用編號為SOG之高分子材料當保護層的特性最好。

並列摘要


In this study, we deposited amorphous indium gallium zinc oxide (a-IGZO) in the active layer by DC sputter, and compared the components of different spin coating with organic material as passivation layers. And found saturation current decay, threshold voltage shift to left direction, Sub-threshold Swing uplift and mobility decreased with passivation cause deterioration of device characteristics. Corollary is that water and organic solvents solvents contact with device resulting in damage with electrical properties of device. Finally, passivation layer with organic material by SOG has the best properties.

參考文獻


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被引用紀錄


官秀華(2016)。應用品質手法改善IGZO-TFT之介電層成膜及蝕刻製程參數〔碩士論文,中原大學〕。華藝線上圖書館。https://doi.org/10.6840/cycu201600526

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