微影曝光設備靜電問題研究與改善對策

本研究是針對曝光設備於曝光過程中，因靜電放電產生之玻璃破片問題進行靜電消除裝置(Photo Ionizer)架設評估，探討藉由靜電消除方式達到品質改善目地。研究過程中實際進行基板傳送測試，利用靜電偵測儀器偵測出靜電放電異常位置與玻璃破片間的相關性，使用CPM(Charge Plate Monitor)儀器探討現況曝光設備靜電消除裝置效能確認，並於曝光設備可架設空間範圍進行靜電消除器架設最佳位置與高度研究。研究中以實驗設計結合反應曲面法來得到此靜電消除裝置最佳架設位置與高度，達到品質改善目的，並建立出後續工程設備之靜電消除裝置架設與靜電消除能力評估標準化流程，以縮短品質對策時間。

關鍵字

微影工程；靜電放電；靜電消除裝置；反應曲面法

並列摘要

This study is to explore the solution with the use of Photo Ionizer for solving ESD-generated glass breaking problem for the exposure equipment. In the study, substrate send test was performed and electrostatic detection equipment (Electrostatic Monitoring System) was used to find the correlation between the locations of abnormal electrostatic discharge and the glass broken. The Charge Plate Monitor was used to check the ability of statics elimination of the Photo Ionizer and to investigate the optimal location of ionizers. Empirical method with use of Response Surface Methodology was used to find the optimal locations of the Photo Ionizer. Finally, the standard operation procedure for Photo Ionizer installation and the assessment of the static elimination ability of a device was set up to reduce the time for quality improvement.

並列關鍵字

electrostatic discharge ； response surface method ； static elimination device ； lithography process

參考文獻

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[13] Myers, R. H., Montgomery, D. C., “Response Surface Methodology: Process and Product Optimization Using Designed Experiments”,2002

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微影曝光設備靜電問題研究與改善對策

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