Researches on Design Simulation and Fabrication Process of Hafnium Oxide and Niobium Oxide Arrayed Waveguide Gratings

二氧化鉿與五氧化二鈮陣列波導光柵設計模擬與薄膜製程特性研究

吳承修(C.S. Wu) ； 賴亦岑(Y.T. Lai) ； 李鵬霄(P.H. Lee) ； 翁敏航(M.H. Weng) ； 劉文仁(W.J. Liu) ； 陳治民(C.M. Chen) ； 賴暎杰(Y.C. Lai)

《材料科學與工程》 38卷4期 (2006/12) Pp. 228-234

https://doi.org/10.6409/JMSE.200612.0228

摘要

本研究內容主要包含二氧化鉿及五氧化二鈮陣列波導光柵(Array Waveguide Grating, AWG)元件設計模擬、製程及膜層光學性質等部分。在元件設計方面，利用折射係數可調變的二氧化鉿與五氧化二鈮爲導光層材料，設計理想之肋狀平面光波導折射係數差異、幾何結構及元件尺寸。研究中顯示波導及星形耦合器經過適當之設計後，在折射係數差異(Refractive Index Difference, ∆)爲26%與35%之情況下，AWG元件輸出穿透頻譜三維理論數值分析之插入損耗、串音及訊號雜訊分別約爲-4.14dB、-23.26dB、-54.5dB及-5.12dB、-15.04dB、-53.25 dB。在製程及膜層光學性質方面，藉由沉積速率對材料微觀結構、表面粗糙度、折射係數及消光係數之影響研究中，選取最佳參數進行實際AWG元件之製作。

關鍵字

陣列波導光柵 ； 二氧化鉿 ； 五氧化二鈮 ； 光通訊

並列摘要

The contents of this research mainly included hafnium oxide and niobium oxide arrayed waveguide gratings (AWG's) design simulation, fabrication process and optical films investigation. In the design aspects, reasonable rib-type planar waveguide with refractive index contrast, geometries, and device layout by using the adjustable refractive index characteristic of hafnium oxide and niobium oxide films. In this study, the geometries of rib waveguides and star couplers were designed suitably, and the hafnium oxide and niobium oxide refractive index difference (∆) were chosen to the values of 26% and 35% respectively. The transmission spectrum of hafnium oxide and niobium oxide AWG's device indicated the insertion loss, crosstalk and side-lobe were -4.14dB, -23.26dB, -54.5dB and -5.12dB, -15.04dB, -53.25dB, respectively, by using 3D beam propagation method. In fabrication process and optical films investigation aspects, the effects of different deposition rates on the microstructure, the surface roughness, the refraction coefficient and the extinction coefficient for choosing optimum fabrication parameters to perform real AWG's devices.

並列關鍵字

AWG ； hafnium oxide ； niobium oxide ； optical communication