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  • 學位論文

應用馬氏田口系統於製程良率預測之研究-以半導體化學氣相沉積製程為例

The Study of Apply Mahalanobis-Taguchi System in Manufacturing Yield Prediction – An Example of Semiconductor Chemical Vapor Deposition Process

指導教授 : 江瑞清

摘要


化學氣相沉積被廣泛的應用在半導體製程,而其薄膜厚度對於後續製程的良率影響甚大,故本研究結合馬氏田口系統(Mahalanobis-Taguchi System, MTS)與預先管制將其應用在半導體良率預測。應用上述兩方法結合後之研究結果 ,將原先監控之13項機台參數縮減為7項機台參數,而該模式判斷正確率高達0.92,本研究提供一快速且精確的良率預測模式。

並列摘要


Chemical Vapor Deposition is wildly using in semiconductor Manufacturing Process, and the thickness of thin film would affect the manufacturing yield. So this study applies Mahalanobis-Taguchi System (MTS) and Pre-control developed recently in yield prediction. This Model make monitor parameters reduce 13 to 7 and Perception accuracy is 0.92. This study provides a fast and accurate yield prediction model.

參考文獻


 吳政修,「應用馬氏田口系統於股價預測之研究-以台灣電子類股為例」,中原大學工業工程研究所,2008年碩士論文
 Chang, Y., & Cheng, F., 2005, “Application Development of Virtual Metrology in Semiconductor Industry, ”The 31th Annual Conference of IEEE.
 Hung, M., Lin, T., Cheng, F. & Lin, R., 2007, “A Novel Virtual Metrology Scheme for Predicting. CVD Thickness in Semiconductor Manufacturing, ”IEEE/ASME Transactions on Mechatronics, Vol.12, No. 3, pp308-316.
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