Title

真空製鍍氟化鑭光學薄膜輔以離子助鍍之研究

Translated Titles

Lanthanum Fluoride Thin Film Deposited by Resistive Heater with Ion-Assisted at Low Temperature

DOI

10.29808/JVSROC.200404.0002

Authors

劉旻忠(Ming-Chung Liu);李正中(Cheng-Chung Lee);童啟弘(Chi-Hong Tung)

Key Words

氟化鑭 ; 蒸鍍 ; 離子輔助蒸鍍 ; 穿透率 ; 折射率 ; 消光係數以及表面微觀結構

PublicationName

真空科技

Volume or Term/Year and Month of Publication

16卷4期(2004 / 04 / 01)

Page #

12 - 16

Content Language

繁體中文

Chinese Abstract

本實驗使用熱阻舟蒸鍍氟化鐦光學薄膜,在低溫下(150℃)配合使用離子輔助蒸鍍技術,研究不同的離子輔助鍍膜參數,藉由成膜後氟化鐦薄膜的穿透率、折射率、消光係數以及表面微觀結構等,所獲得的資訊,找出了合適的鍍膜參數,達到改善氟化鐦膜質的目的。

English Abstract

Abstract--Lanthanum fluoride (LaF3) optical thin film prepared by resistive heater at low temperature (150℃) has been investigated. The working parameter of ion source in the ion-assisted process strongly influences the transmittance, refractive index (n), extinction coefficient (k) and surface morphology of the deposited film. The optimum parameter for the coating processes to improve the thin film quality has been described.

Topic Category 基礎與應用科學 > 基礎與應用科學綜合
基礎與應用科學 > 物理
工程學 > 工程學綜合