DOI
stands for Digital Object Identifier
(
D
igital
O
bject
I
dentifier
)
,
and is the unique identifier for objects on the internet. It can be used to create persistent link and to cite articles.
Using DOI as a persistent link
To create a persistent link, add「http://dx.doi.org/」
「
http://dx.doi.org/
」
before a DOI.
For instance, if the DOI of an article is
10.5297/ser.1201.002
, you can link persistently to the article by entering the following link in your browser:
http://dx.doi.org/
10.5297/ser.1201.002
。
The DOI link will always direct you to the most updated article page no matter how the publisher changes the document's position, avoiding errors when engaging in important research.
Cite a document with DOI
When citing references, you should also cite the DOI if the article has one. If your citation guideline does not include DOIs, you may cite the DOI link.
DOIs allow accurate citations, improve academic contents connections, and allow users to gain better experience across different platforms. Currently, there are more than 70 million DOIs registered for academic contents. If you want to understand more about DOI, please visit airiti DOI Registration ( doi.airiti.com ) 。
張鴻文 , Ph.D Advisor:徐振哲
英文
DOI:
10.6342/NTU.2013.01347
水溶液中放電現象 ; 電漿 ; 電源型式 ; 氣泡表現 ; 頻率響應 ; 極性響應 ; 氣體組成 ; discharges in solution ; plasmas ; power types ; bubble dynamics ; frequency effects ; polarity effects ; gas composition


- 1. D. B. Graves, "Plasma processing," IEEE Trans. Plasma Sci., 22 (1), 31-42 (1994).
連結: - 2. J. Hopwood, "Review of inductively coupled plasmas for plasma processing," Plasma Sources Sci. Technol., 1 (2), 109-116 (1992).
連結: - 3. R. A. Gottscho, C. W. Jurgensen and D. J. Vitkavage, "Microscopic uniformity in plasma-etching," J. Vac. Sci. Technol. B, 10 (5), 2133-2147 (1992).
連結: - 4. V. Rouessac, A. Ungureanu, S. Bangarda, A. Deratani, C. H. Lo, T. C. Wei, K. R. Lee and J. Y. Lai, "Fluorine-free superhydrophobic microstructured films grown by PECVD," Chem. Vapor Depos., 17 (7-9), 198-203 (2011).
連結: - 5. A. Schutze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn and R. F. Hicks, "The atmospheric-pressure plasma jet: A review and comparison to other plasma sources," IEEE Trans. Plasma Sci., 26 (6), 1685-1694 (1998).
連結: