氮化鋁薄膜表面結構及感測特性之研究

Structure and Sensing Properties on a Thin AlN Film

江榮隆(Jung-Lung Chiang) ； 黃安立(An-Li Huang)

《科學與工程技術期刊》 4卷1期 (2008/03) Pp. 73-79

https://doi.org/10.7117/JSET.200803.0073

摘要

本研究係利用射頻濺鍍系統(R. F. sputtering system)於工作壓力10mTorr，分別以不同溫度（50℃、100℃及150℃）備製氮化鋁薄膜於氧化銦錫玻璃(indium tin oxide, ITO)、矽(silicon)及二氧化矽(SiO2)三種不同基板上，以形成AlN(下標 X)/ITO Glass、AlN(下標 X)/Si及AlN(下標 X)/SiO2/Si之結構，並利用場發射掃描式電子顯微鏡(field-emission scanning electron microscope, FE-SEM)觀察氮化鋁薄膜之表面結構，且於AlN薄膜上備製離子選擇物(ionophores)，以成爲氯離子感測膜，利用半導體參數分析儀(keithley 4200)於1~10^(-5)mol/L之氯化鉀(KCl)、氯化鈉(NaCl)及氯化鋰(LiCl)待測溶液中進行測量，以探討氮化鋁薄膜於氯離子感測元件之感測特性。實驗結果顯示氮化鋁薄膜沉積於ITO Glass基板晶粒緻密度高，且晶粒平均大小爲100~150nm，且應用於氯離子感測元件擁有高感測範圍，置於KCl待測液之電壓感測度爲121.48mV/pCl，置於NaCl待測液之電壓感測度爲143.02mV/pCl，而置於LiCl待測液之電壓感測度爲168.72mV/pCl，且線性度趨近於1。

關鍵字

射頻濺鍍 ； 氮化鋁 ； 氧化銦錫玻璃 ； 場發射掃描式電子顯微鏡 ； 氯離子

並列摘要

In this study, a thin aluminum nitride (AlN) film was prepared on various sensing structures (e.g., AlN(subscript X)/ITO glass, AlN(subscript X)/Si and AlN(subscript X)/SiO2/Si) by r.f. sputtering technology. The sputtering pressure was set at 10 mTorr, and the substrate temperatures were maintained at 50℃, 100℃, and 150℃, respectively. Afterwards, a field-emission scanning electron microscope (FE-SEM) was utilized to analyze the surface structure of the AlN(subscript X) film. The ionophores were immobilized on the AlN(subscript X) surface and the chlorine ion sensor finished. Moreover, the sensor devices were immersed in concentrations between 1 mol/L and 10^(-5) mol/L of KCl, NaCl and LiCl buffer solutions, respectively. The sensing-characteristic curves were measured and monitored with a semiconductor parameter analyzer (I-V measurement, keithley 4200). The experimental results revealed that the grain size of the AlN(subscript X) film was about 100~150 nm; moreover, the chlorine ion sensitivities were 121.48 mV/pCl, 143.02 mV/pCl and 168.72 mV/pCl for KCl, NaCl and LiCl solutions, respectively. This sensitivity response is fairly linear, the linear regression being close to 1.

並列關鍵字

r. f. sputtering ； AlN ； ITO glass ； FE-SEM ； chlorine ion