- 學位論文
近場光纖微影及延伸石英管奈米直寫儀之前導性研究
Preliminary Study of Fiber based Near-field Lithography and Extruded Quartz Tube Nanowriter
摘要
世界上各相關研究團隊針對光束偏極態對於光纖式探針的影響之研究與討論，近年來已提出不少理論計算與數值模擬的研究成果，但是鮮少文獻討論到相關的實驗細節。有鑑於此，本論文提出了一套實驗架構去討論軸向偏極態與近場光纖式微影技術結合前導性研究。由實驗結果發現，在光纖探針無鍍膜的條件下，入射光具有不同偏極態時，光阻上的圖形與偏極態在光纖中的模態分佈有相似性的結果。 為了測試本論文所提實驗架構應用於近場微影的應用，本論文研究超薄光阻的調配，過程中使用單甲基醚丙二醇乙酸酯PGMEA (Propylene glycol monomethyl ether acetate)來稀釋正光阻S1813，並經由調配不同的重量百分比，證實可以得到不同的薄光阻厚度，在PGMEA與S1813重量百分比1:8下所得到的厚度為37nm，這個厚度可符合前述近場微影的需求。 最終本論文提出一套具有整合近場微影空間解析度與遠場曝光光機容易整合兩個方法優點的中空石英管曝光系統，研究以拉尖之中空石英管做為光學頭，並使用正光阻S1813於不同的光學頭與光阻間距下進行曝光。藉由觀察光阻上所呈現的曝光圖形，發現在遠場距離下(5μm)可得到與近場聚焦光點相同尺度之微影效果，此現象初步證實本論文所發展的中空石英管曝光系統具有成為奈米直寫儀光學頭元件的機會。
並列摘要
Recently, there have been many researchers worked on fiber based near-field lithography technology. However, issues on the influence of light beam polarization state were mostly analyzed by using theoretical and numerical means only. There were few paper presented experimental results. This thesis developed an optical system to demonstrate the influence of light beam with radial polarization state in fiber-based near-field lithography. Examining light beams of radial polarization and linear polarization states within the optical fiber tip, the pattern etched on the photoresist by different polarization was found to correlate strongly with the intensity distribution of the light beam within the optical fiber tip. In order to verify the viability of our newly developed optical system in near-field lithography, we successfully developed a super-thin positive photoresist film. We utilized PGMEA (Propylene glycol monomethyl ether acetate) to dilute positive photoresist S1813. With different weight percentages, we got different thickness of photoresist film. The thickness of mixture (PGMEA:S1813=1:8) achieved was 37nm, which approached the near-field lithography scale. Finally, the newly developed extruded quartz optical exposure system developed with an attempt to achieve spatial resolution in near–field lithography and ease of alignment in far-field opto-mechanical system for exposure in far-field achieved very encouraging experimental results. In this system, the optical head was an extruded and elongated quartz tube and the photoresist was S1813. To observe the influence of changing the distance between the tube and the photoresist surface, we did a series of experiments to confirm the pattern of focused spot size in far-field approached to that of the near-field lithography. Therefore, the phenomenon can confirm that the extruded quartz tube exposure system may have the potential to become an important subsystem for the development of nanowriters.