The Study on the Fabrication of Nanostructure and Nanomold by Nano-Oxidation and Hydrofluoric Acid Eetching on TiAlN Thin Film

以奈米氧化術與氫氟酸蝕刻在氮化鈦鋁薄膜進行奈米結構與奈米模具製作之研究

黃仁清(Jen-Ching Huang) ； 薛丞碩(Cheng-Shuo Xue) ； 張桂嘉(Gui-Jia Zhang) ； 詹欣銘(Xin-Ming Zhan) ； 劉懷翔(Huail-Siang Liu)

《中國機械工程學刊》 34卷4期 (2013/08) Pp. 353-359

摘要

本文以原子力顯微鏡（Atomic Force Microscope，AFM）在TiAlN薄膜上進行奈米氧化術之探討，研究施加電壓的大小、保存時間及相對溼度等參數對氧化物結構尺寸的影響。並探討以聚二甲基矽氧烷（Polydimethysiloxane，PDMS）翻製奈米結構模具之可行性。在濕蝕刻方面，氫氟酸會將TiAlN薄膜的氧化物給蝕刻掉，而將原本突起之氧化物蝕刻，而變成凹痕圖案。在保存時間方面隨著保存時間的增加，TiAlN氧化物的高度與寬度也會持續的增加。在微奈米模具製作方面，本文成功以PDMS完整翻製出微奈米結構。而由TiAlN奈米結構母模上，剝離出PDMS軟模具，並不會破壞原本TiAlN奈米結構母模，且尺寸差異很小。因此，在TiAlN薄膜上，利用奈米氧化術與濕蝕刻製程，製作奈米結構是可行的方法。

並列摘要

The atomic force microscope (AFM) based on nano-oxidation technology is a high-precision, low-cost, and simple fabrication method, and its most important advantage is that it is not subjected to the limitation of light diffraction so that very tiny elements can be produced. The TiAlN coating generally exhibit high hardness and excellent wear resistance, as well as good toughness. So, the TiAlN coating has good qualities, and therefore is an excellent material for a nano mold. Therefore, the nanomold fabrication on the TiAlN film by combining the nano-oxidation and hydrofluoric acid wet etching was discussed in this paper. In nano-oxidation, the influence of process parameters including the applied voltage and relative humidity on the size of oxide structure were discussed.And explore the feasibility of TiAlN nanostructures mold replication using the Polydimethysiloxane (PDMS) by TiAlN nanomold. After experiments, it can be found that the voltage is higher, the TiAlN oxide of greater height and width. And the higher relative humidity, height and width of the TiAlN oxide are also greater. In wet etching, the hydrofluoric acid (HF) will etch TiAlN oxide, but instead concave. In nanomold, the nanostructures were replicated successfully complete by PDMS. The PDMS soft mold peeling away from the TiAlN nanostructure, and will not damage the original TiAlN nanostructures mold, and the size difference is very small. Therefore, in the TiAlN film, the use of nano-oxidation and wet etching technique to produce nanostructures is feasible.

並列關鍵字

Atomic Force Microscopy ； Nano-oxidation ； Wet etching ； TiAlN ； Polydimethysiloxane (PDMS)