以鈦金屬奈米層輔助氧氣電漿蝕刻製作鑽石奈米柱之研究

Fabrication of diamond nanorods by oxygen plasma etching assisted with a nanoscale titanium metal layer

林文凱(Wen-Kai Lin)

指導教授 ： 黃振昌

國立清華大學/工學院/材料科學工程學系/碩士(2011年)

摘要

利用鈦金屬奈米層輔助氧氣電漿蝕刻製作出鑽石奈米柱，此簡單的方法在本研究已成功發展。研究結果顯示，利用氧氣電漿在100W下，對多晶鑽石膜表面進行蝕刻12 小時，形成的鑽石奈米柱，其平均直徑大約在100-120 nm、長度約為4 um，而經由硫酸(含10 % 過氧化氫)清洗表面的殘餘氧化物，其直徑略縮減了10-20 nm，使其為奈米級柱狀結構。而經由TEM分析證實，鑽石奈米柱為晶向[011]的單晶結構，此有利於奈米元件的製造。最後提出一模型解釋鑽石奈米柱的形成原因，發現由於鑽石膜上的鈦金屬奈米層在蝕刻初期會形成球狀物二氧化鈦氧化物，成為天然的奈米光罩，經長時間的蝕刻後本研究的鑽石奈米柱製作完成。

關鍵字

奈米鑽石

並列摘要

A simple method has been developed to fabricate diamond nanorods by oxyen plasma etching assisted with a nanoscale titanium metal layer. Vertically oriented diamond nanorods were fabricated for 12 hours on polycrystalline diamond substrate by plasma etching at 100W. The average diameter is about 100-120 nm and average length is about 4 um for diamond nanorods. After cleaning residual oxide on diamond nanorods surface using H2SO4, the average diameter reduce to about 10-20 nm. And they would be nano-scale rods structure. Diamond nanorods are single crystal looking from zone axis [011], confirmed by TEM analysis. A modal is proposed to explain how the diamond nanorods are formed. TiO2 nanoparticles are first formed onto diamond film in etching process, And TiO2 acts as nano masks subsequent for oxygen plasma etching. After etching diamond film for a long time, diamond nanorods were successfully formed.

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