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Ni - P化學鍍非均溫析鍍行為研究

Plating Behavior of Nonhomogeneous Heating Deposition for Ni - P Alloy

摘要


化學鍍(無電電鍍)長久以來都採均溫析鍍操控,尚無文獻報導採用非均溫方式析鍍操控化學鍍。本研究主要在探討一種採非均溫操控之化學鎳析鍍行為,其特點在於使沉積速率增快,即使在高溫析鍍時,鍍液穩定性亦佳,本方法可突破傳統加熱法之溫度極限,而不致發生自發性之沉析失控;且所沉析之鍍層物理性質以及化學性質與傳統均溫加熱所沉析之鍍層相較,部分性質近似,部分性質如硬度甚至更優於傳統均溫加熱所鍍層。

並列摘要


The electroless plating is used to depositing at the condition of homogeneous heating for a long time. But, the nonhomogeneous heating deposition has not been reported. This study primarily explores why it can be operated above 100ºC and yet spontaneously destroy. The result reveals deposit which is similar with conventional electroless plating in the chemical and physical properties. Furthermore, its hardness is harder than general electroless deposit at the same operational condition.

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