- 期刊
非對稱性雙極脈衝電漿化學氣相沉積法蒸鍍DLC薄膜於氮氧化處理PM30粉末高速鋼之研究
A Study on Asymmetric Bipolar-pulsed PECVD Process Deposition DLC Films on Oxynitriding-treated PM30 High Speed Steel
摘要
本實驗使用直流脈衝電漿化學氣相沉積法，以非對稱性雙極(-15+10%)負脈衝偏壓方式，利用不同氫氣(H_2)氣體流量(0、0.5、1.0及1.5)，沉積類鑽碳薄膜於氮氧化處理後之PM30高速鋼。接著透過拉曼分析、磨耗測試、硬度測試、奈米壓痕及腐蝕試驗等，以檢測類鑽碳薄膜在氮氧化/類鑽碳處理PM30高速鋼之性質。實驗結果顯示，氮氧化/類鑽碳膜複合表面處理可以成功地在PM30粉末高速鋼上沉積類鑽碳薄膜，其氮氧化層厚度約為28 μm。使用非對稱雙極負脈衝偏壓方式，經由適當電壓150 V、沉積時間90分鐘以及甲烷(CH_4)氣體流量為15 sccm、氬氣(Ar)氣體流量為1 sccm、H_2氣體流量為0 sccm時，所沉積之類鑽碳薄膜具有最佳的機械性質；同時此參數的複合表面處理具有最低的磨耗體積損失量(荷重1.96 N及4.9 N之磨耗試驗中，分別為3.82×10^(-3) mm^3及5.49×10^(-3) mm^3)。而在本研究中，DLC薄膜中含有較多的sp^3鍵結能夠提升其抗腐蝕能力，當CH_4氣體流量為15 sccm、H_2氣體流量為0 sccm時，在3.5 wt% NaCl溶液的腐蝕試驗中，其具有最低的腐蝕電流(1.43×10^(-4) A‧cm^(-2))及最高的極化阻抗(531.94Ω‧cm^2)。
並列摘要
In this study, DLC films were coated on oxynitriding treated PM30 high speed steel by asymmetric bipolar-pulsed PECVD process. We conducted laboratory experiments with various H_2 gas flows (0.5, 1.0 and 1.5) at asymmetric bipolar-pulsed voltage (-15+10%). To compare the properties of the DLC films for oxynitriding/DLC-treated PM30 high speed steel, Raman spectroscopy analysis, wear tests, scratch tests, hardness tests, Rockwell indentation, nano-indentation and corrosion resistance inspections were performed. Results showed that 28 μm of oxynitriding layer was successfully coated on oxynitriding/DLC duplex treated PM30 High Speed Steel. The duplex coating layers had optimal properties when DLC films were prepared by asymmetric bipolar-pulsed PECVD process at an appropriate volt (150 V), 90 min deposition time, 15 sccm CH_4 gas flow, 1 sccm Ar gas flow, and 0 sccm H_2 gas flow. It had the lowest wear volume loss (3.82×10^(-3) mm^3 when the load was 1.96 N and 5.49×10^(-3) mm^3 when the load was 4.9 N). When more sp^3 bond content in DLC film, it improved its corrosion resistance. When the CH_4 gas flow was 15 sccm, H_2 gas flow 0 sccm, it had the lowest corrosion current (Icorr=1.43×10^(-4) A‧cm^(-2)) and highest polarization resistance (Rp=531.94 Ω‧cm^2) in 3.5 wt% NaCl solutions.
延伸閱讀
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