高功率雷射鏡鍍膜技術開發

Novel Optical Coating for 100 W High Power Laser

黃國隆(Kuo-Lung Huang) ； 陳君閣(Chun-Ko Chen)

《真空科技》 28卷3期 (2015/09) Pp. 27-31

摘要

為提高雷射系統的光學品質，光學薄膜技術普遍應用在其光學元件上，而要達到理想的光學薄膜，一般而言都在是真空中使用PVD（Physical Vapor Deposition）較易完成。其中薄膜的膜質關係到其系統的穩定性與可靠性，故本研究測試不同的鍍膜參數，藉由AFM（Atom Force Microscope）與SEM（Scanning Electron Microscope）等檢測儀器進行比對分析。而將較好的成膜條件導入光學元件之薄膜設計，製造1.0度入射，1064+/-10nm，R(%)＜0.1%，2. 45度入射，1064+/-10nm，T(%)＞99%；808+/-10nm，R(%)＞99.9%，3. 45度入射，1064+/-10 and 532+/-10nm，R(%)＞99.9%的光學薄膜，並經高功率測試，Damage Threshold可承受20J/cm^2@1064 4ns pulsed的強度。

關鍵字

物理氣相沉積 ； 光學薄膜

並列摘要

In order to advance the optical quality in the laser system, it would be applied to various devices by optical thin film technology. It could be processed easily by PVD (Physical Vapor Deposition) in normal cases. Because the quality of thin film will be the point of laser system, it would be tested in different parameters of coating. And then the quality of films could be analyzed by AFM (Atom Force Microscope) and SEM (Scanning Electron Microscope), the best setting of parameters would be used for optical thin film of devices. The AR coating AOI 0 degree 1064+/-10nm, R (%)＜0.1%, Edge filter AOI 45 degree 1064+/-10nm, T(%)＞99 %; 808+/-10 nm R(%)＞99.9 %, High reflector AOI 45degree 1064+/-10 and 532+/-10nm R(%)＞99.9% would be fabricated to combine the coating conditions and optical designs. For the high power testing, the films could be stood in the background of Damage Threshold 20 J/cm2 @1064 4ns pulsed.

並列關鍵字

Physic Vapor Deposition ； Optical Thin Film