陰極真空電弧沉積氧化鋅透明導電薄膜於PVB基板之特性

Characteristics of the zinc oxide transparent conductive thin film on the PVB substrate by using cathodic vacuum arc deposition system

潘正堂(Cheng-Tang Pan) ； 楊茹媛(Ru-Yuan Yang) ； 黃健瑋(Chien-Wei Huang)

《真空科技》 32卷3期 (2019/09) Pp. 23~1-23~5

摘要

陰極真空電弧沉積（Cathodic vacuum arc deposition, CVAD）系統屬於高能量物理沉積製程技術，其特性在於製程過程中不需要高基板溫度（≦75˚C），沉積出來的膜層卻具有高溫製程的特性。非常適合沉積化合物薄膜於耐熱性低的高分子基板上，如聚對苯二甲酸乙二酯（Polyethylene terephthalate, PET）和聚乙烯醇縮丁醛（polyvinyl butyral, PVB）等。因此本研究利用陰極真空電弧沉積系統沉積純氧化鋅（Zinc oxide, ZnO）透明導電薄膜在聚乙烯醇縮丁醛（PVB）基板和玻璃基板上，並且利用X-射線繞射分析（X-ray diffraction, XRD）來分析薄膜材料晶體結構、紫外-可見分光光度法（Ultraviolet-Visible spectroscopy, UV-Vis）來分析薄膜的透光性、而霍爾量測儀（Hall measurements）和四點探針（Four-point probe analysis）來分析薄膜的電特性。藉由上述分析來討論純氧化鋅透明導電薄膜在高分子基板上之表現。

關鍵字

氧化鋅 ； 陰極電弧 ； 聚乙烯醇縮丁醛

並列摘要

The cathodic vacuum arc deposition system belongs to a high energy physical deposition process. The film by using CVAD system has a good characteristic as the high-temperature deposition process, but the CVAD system has not high substrate temperature (≦ 75 ˚C). It was good deposition the compound film on the low hit resistance polymer substrate, such as polyethylene terephthalate (PET) and polyvinyl butyral (PVB), etc. Therefore, this study fabricated and analyzed the pure zinc oxide (ZnO) transparent conductive thin film on the PVB substrate and glass substrate by using cathodic vacuum arc deposition system, X-ray diffraction (XRD), ultraviolet-visible (UV-Vis) spectroscopy , Hall measurements and four-point probe analysis. These measuring machines were used to ascertain the microstructure, optical and electrical properties. Also, the analysis can evaluate the performance of pure zinc oxide transparent conductive film on polymer substrates.

並列關鍵字

Zinc Oxide (ZnO) ； Cathodic Arc ； Polyvinyl butyral (PVB)