以電子顯微鏡為基礎之電子束曝光機的改裝與應用

Scanning-Electron-Microscope-Based E-Beam Writer and Its Applications in the Fabrication of Nano-Electronic Devices

陳啟東(Chii-Dong Chen) ； 吳憲昌(Cen-Shawn Wu)

《科儀新知》 146期 (2005/06) Pp. 63-72

https://doi.org/10.29662/IT.200506.0007

摘要

曝光及成像是奈米結構製程中的一項關鍵技術。在新元件研發過程中，往往希望能在短時間內不需光罩就可以作成奈米結構，電子束曝光技術提供了一套很適合這目的的解決方案。以電子顯微鏡改裝成的簡易電子束曝光機在性能上雖比不上設計精良的專業化電子束曝光機，但在很多情況下可以符合研發工作的要求，可說是經濟實用的方案。在這篇文章中，筆者簡單的介紹了電子束微影的技術，也敘述了我們改裝電子顯微鏡的經驗及需注意的關鍵技術。

並列摘要

Electron beam lithography is a quick and perfect solution for the fabrication of small amount of prototype nano-scaled structures where frequently changes in design are necessary and the conventional photolithography with optical masks is found ineffective. Although a simply constructed scanning-electron-microscope (SEM)-based e-beam writer can not be on a par with the commercially available multi-million-dollar e-beam writers, it offers a cost-effective solution for the research and development laboratories. In this article we briefly introduce the e-beam lithography techniques, and we describe our experiences in the modification of an SEM into an e-beam writer. Key issues are discussed and examples of fabricated nano-devices are presented.