本文之目的在於運用奈米壓印微影技術實現奈米直寫儀的光學頭製作。奈米直寫儀採用通過次波長週期性結構所造成異常光學穿透與指向性現象的光學頭,產生非透鏡方式傳播之奈米聚焦光束,以建構具有高穿透能量且光束發散角度小的曝光設備,有效提升系統的解析度。鑒於傳統製程之成本甚高,本研究選擇高輸出、低成本的奈米壓印微影製作奈米直寫儀之光學頭,以祈能提供另種相對便宜的奈米結構製作方法。 模具製作之良窳筱關奈米壓印微影成果之品質,本研究使用電子束直寫儀定義奈米圖案,再操作電感耦合電漿蝕刻機將結構轉移至三吋矽晶圓,最後成它a使用熱壓成型機壓印三吋晶圓範圍的奈米圖形陣列。舉凡電子束微影設計圖案之概念及曝光顯影的參數選用、電感耦合電漿蝕刻所遭遇問題探討、依據材料性質搭配熱壓設備調整壓印時之狀態等,皆於文中依序討論。
The objective of this thesis is on the fabrication of optical heads for nanowriters using nanoimprint lithography. Nanowriters focus light by sub-wavelength periodic structures, in which extraordinary optical transmission and directional beaming phenomena occur. The phenomena exhibit high energy transmission and small divergence angle so that nanometer light beams can be induced without using optical lens. Consequently nanowriters can provide better exposure resolution than conventional laser writers. Because the cost for optical heads is high with conventional fabrication methods, nanoimprint lithography, a high-throughput, low-cost method, is chosen to make nanowriter optical heads. Let is hoped that such a fabrication process can provider an economical alternative for mass production of optical head. The quality of a mold greatly affects the results of nanoimprint lithography. This work uses e-beam writer to define nano-patterns and then manipulates ICP to transfer structures to 3-inch silicon wafers. Finally hot embossing machine is utilized to imprint nano-pattern arrays on 3-inch wafer. The related details are discussed in this work. The discussions include: some conception of e-beam lithography patterning design and parameters of exposure and develop, the problems during ICP etching, adjusting imprint status by material properties and hot embossing equipment.