本實驗室已成它X成二氧化矽主鏈壓克力混成材料,首先將粒徑介於20至25nm的SiO2顆粒表面改質成壓克力基,利用MPS(3-Methacryloxypropyl Trimethoxy Silane)經水解與縮合,即接在SiO2顆粒表面,再加入壓克力單體TEGDA(Tetraethylene glycol diacrylate),藉以調控有機無機的比例。合成樣品之氧化物含量介於10至60wt%之間,其折射率介於1.4至1.6之間,可藉調控SiO2含量改變折射率,當SiO2含量增加時,折射率會降低。此系統中之光穿透率在1310與1550nm皆大於95%,耐熱性隨著SiO2奈米粒子加入量越多,而明顯提升,當加入60wt% SiO2奈米粒子後,熱裂解溫度比純壓克力增加了近50℃,而加入SiO2顆粒量超過40wt%後,即無明顯玻璃轉化溫度(Tg),推測其Tg>200℃。而最佳化之樣品為MPS/SiO2=0.25(莫爾比)且無機氧化物SiO2含量為40wt%,其透光率在50μm的厚度下,可高達97%以上,折射率為1.50左右。
We have synthesized SiO2-main chain acrylate material successfully. First, the surface of SiO2 nanoparticle was modified with MPS (3-Methacryloxypropyl Trimethoxy Silane). Then TEGDA (Tetraethylene glycol diacrylate) was added to control the amount of organic-inorganic ratio(10-60wt%). The refractive index is between 1.4 and 1.6 and would be decreased with the increase of SiO2 amount. The optical transparency at 1310nm and 1550nm is above 95%. With 60wt% SiO2 amount, the thermal decomposition temperature will increase about 50℃. More than 40wt%, there is no obvious Tg below 200℃. The optimized sample is MPS/SiO2=0.25(wt ratio) and 40wt% SiO2.