電泳披覆製備奈米氧化銅薄膜及其特性研究

Characterization of Nano Copper Oxide Thin Films Prepared by Electrophoretic Deposition

魏志豪(Chih-Hao Wei)

指導教授 ： 鍾清枝

國立臺北科技大學/機電學院/製造科技研究所/碩士(2005年)

摘要

本研究旨在以製程簡易之電泳披覆法(Electrophoretic Deposition，EPD)，將本實驗室SANSS(真空潛弧系統)製備的奈米氧化銅流體披覆於不鏽鋼基材上並探討披覆膜的性質與特性。為得到良好的披覆膜，首先對於奈米氧化銅流體進行粒徑篩選使奈米顆粒粒徑趨於一致，為了不讓氧化銅顆粒容易產生聚集影響披覆效果故將懸浮液之pH值調成6.0，接著進行電泳披覆試驗探討在各披覆條件(懸浮液濃度、電壓、披覆時間)下對披覆膜的影響，以及在披覆試驗完成後進行燒結緻密、微硬度及光吸收性試驗及檢測來觀察奈米氧化銅披覆膜的性質與特性。
實驗結果顯示:(1)奈米氧化銅流體已可以在 的鏡面不鏽鋼基板上形成一氧化銅披覆膜，(2)離心篩選參數設定在6000rpm、5min時可得一較適合應用在電泳披覆製程的奈米氧化銅流體，(3)在披覆電壓230V、披覆時間5min時可得較佳的氧化銅披覆膜， (4)燒結溫度至300℃時，氧化銅奈米顆粒會有再熾的現象產生，且升溫速度太快會使得披覆膜緻密性無法得到有效的改善，故以2℃/min燒結至200℃可得一表面緻密性較佳的披覆膜(5)本研究製備之奈米氧化銅披覆膜之微硬度可達Hv110以上。(6)奈米氧化銅披覆膜經光吸收測試實驗後發現在可見光到紫外光有比較強的吸收能譜，且吸收強度隨著披覆時間的增加而有正比的趨勢。

關鍵字

電泳披覆 ； 奈米氧化銅流體 ； 燒結緻密 ； 微硬度 ； 光吸收性

並列摘要

In this study, we use electrophoretic deposition (EPD) to deposit the CuO -nanoparticles films coated on the stainless steels and discuss their properties and characteristics. To obtain good films, CuO nanoparticles were sifted to make the nanoparticle sizes accordant and the pH value of the solution was set 6.0 to prevent CuO nanoparticles from aggregating; the effects of some parameters of EPD including concentration of solution, voltage and time were discussed. After the deposition test, sintering test, micro-hardness test, and light absorption test are used to detect the CuO deposited films.
The results show that (1) CuO nanoparticles could be deposited as the films on the stainless steel whose dimension is ，(2) CuO nanparticles having proper conditions applied in the EPD are set to 6000 rpm and 5min， (3) the better CuO films are deposited under the voltage of 230 V and time of 5 min，(4) when the sintering temperature was promoted to 300℃, CuO nanparticles would be melt；the density of the films wouldn’t be improved by the rapid temperature to treat sample. Hence the films with excellent surface density could be obtained at sintering temperature of 200℃ per 2℃/min，(5)The micro-hardness of CuO deposit film attend to Hv110. After the of light absorption, visible light to ultraviolet rays have stronger absorption spectrum, and the absorption intensity is proportion to deposited time.

並列關鍵字

electrophoretic deposition ； CuO nanofluid ； sintering ； micro-hardness ； light absorption

參考文獻

[1] Toshiro Maruyama, “Copper oxide thin films prepared by chemical vapor deposition from copper dipivaloylmethanate”, Solar Energy Materials & Solar Cells, Vol.56, pp.85-92, 1998.

[2] M. Frietsch, F. Zudock, J. Goschnick, M. Bruns, “CuO catalytic membrane as selectivity trimmer for metal oxide gas sensors”, Sensors and Actuators, Vol.65, pp.379-381, 2000.

[10] 林昱呈，電泳披覆法製備錳鋅鐵氧磁體鍍膜之研究，國立成功大學材料科學及工程學系碩士論文，2002年6月。

[14] H. A. Fisch, ”Electrophoretic Deposition of Aluminide Coatings from Aqueous Suspensions”, J. Electrochem. Soc., pp.57-64 , 1975.

[17] H. C. Hamaker, “Formation of a Deposit by Electrophoresis”, Trans. Faraday Soc., Vol.36, pp.287-295, 1940.