本論文係研究銀(Ag)/氧化鋅掺雜氧化銦(ZIO)雙層結構的反射式歐姆接觸電極,以應用於覆晶式發光二極體。本論文的研究方法係以射頻反應式磁控濺鍍法成長氧化鋅掺雜氧化銦(ZIO)與銀(Ag)材料於玻璃基板上,藉由改變濺鍍參數,如濺鍍壓力、氬氣流量及射頻功率等,探討濺鍍參數對於氧化鋅摻雜氧化銦(ZIO)與銀(Ag)薄膜各種性質之影響。 實驗結果顯示,氧化鋅摻雜氧化銦薄膜在可見光470nm下穿透率為80~90%。在460 nm的波長下,Ag/ZIO結構的反射率約為85%。另一方面,在460 nm的波長下,ZIO/Ag結構的反射率約為68%。因此,前者可以較適合應用於藍光覆晶式發光二極體。
This dissertation investigates the growth and characteristics of double Ag/ZIO layers on glass for reflective ohmic contact by RF reactive magnetron sputtering. By changing the deposition condition, we analyzed how the different parameters affect the characteristics of ZIO and Ag on Flip-Chip LEDs application. We found that the light-transmission of ZIO film is about 80~90% at 470 nm blue light. The light-reflection of Ag/ZIO flim is about 85% at 460 nm blue light. The light-reflection of ZIO/Ag flim is about 68% at 460 nm blue light.So Ag/ZIO flim is a better solution to applied to InGaN-Flip-Chip LEDs.