本研究係以射頻反應式磁控濺鍍機濺鍍鋁膜於單晶矽基板上,利用陽極氧化處理,使鋁膜產生孔洞的陽極氧化鋁(anodic aluminum oxide, AAO)膜,並觀察其表面的孔洞結構。在完成AAO/矽基板表面結構觀察後,以陽極氧化鋁膜當作光罩,利用乾式蝕刻的方式蝕刻矽基板,使其產生與AAO一樣的孔洞結構。再以旋轉塗佈(Spin coating)的方式塗ZnPc(Zinc phthalocyanine)溶液在具有奈米孔洞之矽基板上,最後在正面和背面分別製作電極,以形成 ZnPc/奈米孔洞矽之混合型太陽能電池。 本研究嘗試摻雜I2及聚甲基丙烯酸甲酯(Polymethylmethacrylate, PMMA)於ZnPc內,降低其串聯電阻,可得電流密度Jsc=0.41mA/cm2,開路電壓Voc =0.195V,填充因子FF=0.17,效率η=0.781%。 若摻雜金奈米粒子於矽基板上,並經由快速退火爐進行退火,並加入PEDOT:PSS做為緩衝層可得電流密度Jsc=5.65mA/cm2,開路電壓Voc=0.355V,填充因子FF=0.24,效率η=4.88%。
This work reports an aluminum film on a silicon (Si) substrate deposited by a sputtering method. Then, nanoporous structure was prepared using anodic aluminum oxide (AAO) process, and after process optimized, it was employed as a mask to produce nanoporous structure on the surface of the Si substrate by plasma etching. Subsequently, an ZnPc film was formed on Si substrate with nanoporous structure by spin coating. Anode and cathode were produced on the front side and backside, respectively. Finally, an ZnPc/nanoporous Si hybird solar cell was obtained.