本研究目的在於發展光譜分析式彩色共焦干涉之顯微三維形貌量測方法與量測用光學探頭,藉由整合彩色共焦與光譜分析式之白光干涉量測術,其原理係利用寬頻光源(400-700nm)與實驗室自行設計之折射式色散物鏡,依據軸向色散不同波長聚焦於不同深度位置之特性,可單次擷取待測物深度資訊無須進行垂直掃描,即可達到彩色共焦量測術具大深度量測範圍且快速量測之優勢,同時結合白光Linnik干涉式系統架構,應用彩色干涉訊號具備細切割與高量測解析之特點,獲得更精確之深度資訊,進而提升在大深度量測範圍內之量測解析。並發展光譜解析式之量測技術進行區域量測,可免除機械式垂直掃描,減少量測所需時間,提升量測效率。 此彩色共焦干涉式光學三維量測系統與其關鍵技術,在於改善軸向焦散範圍越大,量測解析會降低之缺點,以及避免垂直掃描受環境干擾之影響,減少量測誤差,並可達到大深度量測範圍與高量測解析之能力。
In this research, new nano-scale measurement methodology based on spectrally-resolved chromatic confocal interferometry (SRCCI) was successfully developed by employing integration of chromatic confocal sectioning and spectrally-resolve white light interferometry (SRWLI) for microscopic three dimensional surface profilometry. The proposed chromatic confocal method (CCM) using a broad band while light in combination with a specially designed chromatic dispersion objective is capable of simultaneously acquiring multiple images at a large range of object depths to perform surface 3-D reconstruction by single image shot without vertical scanning and correspondingly achieving a high measurement depth range up to hundreds of micrometers. A Linnik-type interferometric configuration based on spectrally resolved white light interferometry is developed and integrated with the CCM to simultaneously achieve nano-scale axis resolution for the detection point. The white-light interferograms acquired at the exit plane of the spectrometer possess a continuous variation of wavelength along the chromaticity axis, in which the light intensity reaches to its peak when the optical path difference equals to zero between two optical arms.