利用電子鎗蒸鍍系統與斜向沉積技術 (oblique angle deposition) 所造成的遮蔽效應,製鍍出具有柱狀結構之金屬薄膜。 在實驗量測上,利用walk-off干涉儀,量測垂直於薄膜沉積平面之偏振光(s-polarization)與平行於薄膜沉積平面之偏振光(p-polarization)的透射率與反射率,及s、p偏振光正向入射於銀奈米柱陣列薄膜在特定波長下與空氣的透射式與反射式相位差,由透射係數與反射係數並利用生物型掃描式電子顯微鏡觀察銀奈米柱陣列薄膜之厚度,求得在特定波長下s偏振光的折射率。另外,利用橢圓儀量測技術進行銀奈米柱陣列薄膜的量測求得其雙折率差,並利用s偏振光的折射率推算可能的p偏振光折射率。
The metal thin films with microscopic columnar structures are fabricated using electron beam gun evaporation system and oblique angle deposition technique. The transmission and reflection coefficients for s-polarization and p-polarization of silver nanorod array are measured by walk-off interferometer. Besides transmission and reflection intensities, phase difference between thin film and air are also measured. From the transmission and reflection coefficients, the equivalent refractive index for s-polarization can be derived. The birefringence of silver nanorod array is measured by ellipsometry and compared with s-polarization measurement to get the equivalent refractive index for p-polarization light.