由於目前光罩的需求量越來越大,為了提升產品的良率且降低製造成本,於是本文以垂直層流式光罩盒儲存櫃為研究課題,並著重於內部流場與污染物排除的分析;期望以不變動內部元件配置,且節省經濟成本的方式作為設計之基礎,利用有限體積法的軟體FLUENT 來分析計算其結果。針對不同的風機風量及光罩擺放配置,相互比較其整體流場之差異性,並探討其污染物的排除效率。 移動物體在潔淨室或微環境中內通常會破壞強調「單一流向」的氣流流型,乃至於造成微粒被捲入渦流中進而造成對製程本身或產品的污染,所以採用暫態之動態網格方式,分析光罩自動運載裝置運動狀態之流場分佈,以模擬真實狀況中,分析三種不同的移動速度對內部氣流所造成之重大影響。 結果顯示,當光罩盒儲存櫃的風機風量越大時,污染物的排除效率是最好的,而比較光罩擺置位置則是全部擺滿光罩污染物移除效率較好,其次是光罩對稱擺放,最差的為將光罩擺放同一區,光罩盒自動運載裝置的移動速度越慢越不容易影響氣流的擾動,而速度越快氣流所產生的擾動越大,越容易使污染物懸浮在迴流區。
Photo-masks play the essential role of photographic negative film in the manufacturing of microelectronics components such as chips, wafers, MEMS or LCD panels. To meet the increasing demand of photo-masks, it is necessary to maintain high production yield rate of photo-masks with minimum production costs. This study aimed to numerically investigate the effects of airflow rate and photo-masks arrangements on the flow field and contaminant removal performance in a laminar flow stocker, which used to protect the photo-masks from contaminants, without changing its internal components configuration in conjunction with cost-saving concerns. Finite Volume Method (FVM) was applied in numerical analysis by using Computational Fluid Dynamics (CFD) software, Fluent. Then, to simulate the actual operating condition, the effects of loading speeds of photo-masks on flow field in the stocker is further analyzed by using the moving mesh. Based on the results, higher airflow rate will provide better contaminant removal rate in the stocker. As for photo-masks arrangements in the stocker, the full coverage of photo-masks in the stocker will provide the most satisfactory contaminant removal rate, and followed by the symmetrical photo-masks arrangement, and the unilateral photo-masks arrangement will give the poorest contaminant removal in comparison. As for loading speeds of photo-masks, the flow field in the stocker will be less likely to be disrupted at lower loading speed, meanwhile, higher loading speed will disrupt the flow field and cause the suspension of contaminants in the recirculation zone.