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  • 學位論文

氧化鋅奈米線成長控制之研究

The study of fabrication of ZnO nanowires

指導教授 : 王耀德

摘要


本研究的目的是成長寬能隙半導體材料的奈米線,改善目前文獻上關於奈米線成長方向性和成長機制了解的不足,以對我國LED技術發展上有所貢獻。本研究是利用Sputtering濺鍍Buffer layer在玻璃基板上,再利用超音波噴霧輔助法,透過Vapor-Lquid-Solid(VLS)機制,使基板在適當的溫度和壓力下成長出氧化鋅奈米柱之結構。首先觀察不同濃度的奈米金溶液對奈米線的影響,再觀察不同基板溫度下的奈米線成長有何不同,整理成長時間對長度的變化,最後觀察玻璃基板上成長的奈米線之結構和方向性。實驗中利用原子力顯微鏡(Atomic Force Microscope)、掃描式電子顯微鏡(Scanning Electron Microscope)、光激發光譜儀(PL)和X光繞射儀(XRD)等儀器測量試片的特性。X光繞射儀(XRD)結果計算出( 0 0 2 )方向的比例,在不同的濃度影響奈米線的直徑寬度和密度,以及在不同溫度下所造成的影響。玻璃基板成長時間影響奈米線的長度和方向性,而Buffer layer有助改善氧化鋅奈米線成長機制。在光激發光譜儀(PL)上,發現不同基板下的奈米線,有所不同的發光特性。

並列摘要


The role of a ZnO buffer layer on the Vapor-Liquid-Solid (VLS) of ZnO nanowire arrays was analyzed. ZnO buffer layers were deposited on conducting glass substrates by sputtering process. A simple and controllable method has been developed to synthesize well-aligned ZnO nanowire arrays on silicon and glass substrates. The properties of ZnO nanowires changed with growth time. A thin ZnO Buffer layer coated on glass was introduced to control the direction and crystalline of ZnO nanowires. X-ray diffraction (XRD) and scanning electron microscopy (SEM) results showed the high dense and well-aligned character of ZnO nanowires. The photoluminescence (PL) reveals the high crystalline quality of the nanowires. The growth mechanism of ZnO nanowires was also discussed.

參考文獻


[6] M. Joseph, H. Tabata, T. Kawai, Jpn. J. Appl. Phys. 38, 2505 (1999).
[8] R. L. Hoffman, Appl. Phys. Lett. 82, 733 (2003)
[10] A. B. Djurisic at el., Appl. Phys. Lett. 88, 103107 (2006).
[11] X. T. Zhang, Y. C. Liu, Z. Z. Zhi, J. Y. Zhang, Y. M. Lu, D. Z. Shen,X. G. Kong, Journal of Luminescence, 99, 149 (2002).
[12] D. R. Vij, N. Singh, Luminescence and Related Preperties of II-VI

被引用紀錄


黃博良(2012)。以無催化劑輔助的方式於玻璃基板成長氧化鋅奈米柱〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0006-0102201213160000

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