雙靶式交流濺鍍機鍍製光學薄膜之特性分析與提高薄膜鍍製良率之研究

A Study of Manufacturing Characteristic Analysis and Promoting the Yield of the Optical Thin Films Coated with Dual-Target AC Sputter

邱議賢(Yi-Hsian Chiou)

指導教授 ： 林啟瑞 ； 蘇春熺

國立臺北科技大學/機電學院/機電整合研究所/碩士(2007年)

摘要

設計以及製造各種單層及多層光學薄膜來達到科學以及工程上的應用為目前光電產業中相當重要的部份，其基本上是由高低折射率的光學薄膜互相搭配而成，藉由膜層間的干涉作用而達到特定用途，光學薄膜的應用，在我們的生活中已習習相關。
目前台灣業界大多使用蒸鍍機系統來製鍍光學薄膜，但其缺點包含鍍製速度慢、薄膜強度較差、膜厚偵測器具有一定量的誤差等。目前業界引進新式鍍膜機-雙靶式交流濺鍍機(Dual-Targets AC Sputter)，其具有薄膜鍍製快速、薄膜強度強、產量大、薄膜均勻性佳等優點，並且利用時間來控制膜厚，達到更精準之鍍膜厚度；但此機台在校正沉積速率時，每校正一次需花費8~16小時的高工時，為此機台在業界競爭上之隱憂。
本研究利用雙靶式交流濺鍍機製鍍出之光學薄膜證明其具有均勻性佳、膜強度佳、附著性良好等優點，而且可精確達到所設計之光譜規範；再針對此一機台在鍍製光學薄膜時所發生之主要不良缺點-亮點、刮傷、脫膜加以改善，以製鍍出高品質、高良率之光學濾光片，提升在業界之競爭力。

關鍵字

雙靶式交流濺鍍機 ； 光學薄膜 ； 良率 ； 濾光片

並列摘要

The applications of the optics thin films are relevant in our life. It is very important to design and make up various kinds of single-layer and multi-layer optical thin films in science and engineering presently.
The industry use Thermal Evaporator to make the optical thin films mostly. But the shortcoming includes producing slowly, worse in intensity, and the error in membrane detectors. Presently, the industry introduce the new-type coating machine “ Dual-Targets AC Sputter” . The advantage includes producing fast, strong in intensity, good quantity of output, and homogeneously. And it use the time to control the film thickness, and reach the accurate thickness of optical thin films.　But it is worried that to correcting the depositing rate may take 8~16 hours for each time.
In this study, to prove the optical thin films coated by Dual-Targets AC Sputter have the advantages of homogeneous, strong in intensity and adhering. And it could be achieve the standard which we designed. And to improve the main shortcomings produce in this machine：particles, scratch, and the film peeling off. To produce the optical filter in high quality and high yield, and to advance the competitiveness in the industry.

並列關鍵字

Dual-Targets AC Sputter ； Optical Thin Films ； Promoting the Yield ； Optical Filter

參考文獻

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