在傳統的通風安排,非單向流潔淨室使用牆壁返回系統包含一個天花板供風系統,並利用兩側牆回風。工業潔淨室,如半導體和TFT - LCD的潔淨室,然而,此外,這些潔淨室和這些粒子非常小,只有次微米粒子的程度與終端移動速度時,在潔淨的空氣。傳統的潔淨室中使用的回風系統具有高冷負荷旨在建立一個統一的空氣溫度分佈和顆粒濃度的環境,向下冷空氣從天花板送風經由濾網遇到製程機台所產生的高發熱及高汙染之上升氣流,會造成流場紊流產生。為了解決這一問題,本研究提出了一個獨特的在地化回風系統,可以大大改善空氣潔淨程度和消除熱負荷。主要是一種風機乾盤管單元( FDCU ),以便解決製程機台所產生之熱量和粒子。擬議的新系統,因此稱為FDCU系統,實驗研究進行了全面的潔淨室的實際進程的工具的性能比較,這兩個系統。結果顯示使用FDCU系統可有效排出50%以上的污染物,相對於傳統的牆回風系統,如高靜壓會和高流動阻力,FDCU系統也有助於解決問題。
In a traditional ventilation arrangement, a wall return system containing a ceiling air supply and wall exhaust is used in non-unidirectional airflow type cleanrooms. In industrial cleanrooms, such as semiconductor and TFT-LCD cleanrooms, however, larger process tools result in smaller passage of airflows towards the wall-exhaust vents due to larger footprints and volumes of process tools. Additionally, only sub-micron particles are a concern for these cleanrooms and these particles are with very small magnitudes of terminal velocities when moving in cleanroom air. The conventional wall return system used in existing high cooling load cleanrooms aims to create a uniform air temperature distribution and a diluted particle concentration environment in which the downward cold supply air from ceiling filters encounters upward air currents due to exhaust heat as well as particle sources from process tools. To address the problem, this study proposes a unique local air exhaust system that can significantly improve the air cleanliness level and remove heat loads efficiently simultaneously. The main component is a Fan Dry Coil Unit (FDCU) installed on the ceiling above the process tool in order to extract heat and particles released from the tool. The new proposed system is therefore referred as the FDCU system. An experimental study was conducted in a full-scale cleanroom with real process tools to compare the performance of both systems. Results show that more than 50% of particles were eliminated by the proposed FDCU system as compared to that of the conventional wall return system. The proposed FDCU system is also useful for solving problems such as a high negative static pressure in the supply chamber and high flow resistance in the flow path of the conventional wall return system.