提升平面顯示器廠去光阻劑回收率之探討

Research on improving the recovery rate for Stripper Reclaim System of the FPD

紀博文(Po Wen Chi)

指導教授 ： 李碩仁

元智大學/工程學院/機械工程學系/碩士(2007年)

摘要

去光阻劑(Stripper)又稱為剝離液，為TFT LCD廠前段製程中使用量僅次於顯影液之化學品，大多由國外進口，單價極高，而使用後之廢去光阻劑僅含少量不純物，極具回收純化價值。光電業一般所使用之去光阻劑,分別有TOK106與N300兩種, TOK106其主要成份有70%之MEA及DMSO 30%，而 N300主要成份為70%之BDG及MEA 30%兩者差異除了MEA比例不同外，在製程上的運用也有乾、濕製程技術之差異。
本研究內容主要為探討影響光電廠去光阻劑回收系統薄膜蒸發器單元效能的主要控制因子，並進行田口方法與全因子實驗差異比較來推估其最佳化之操作條件，進而作為未來實廠在實際操作上系統參數調整之指標。
本研究依據文獻選用進料量、蒸氣壓力、轉速，作為田口方法的控制因子(Control Factor)，並以薄膜蒸發器蒸發率作為品質特性(Quality Characteristic)，應用田口法直交表規劃實驗，所得結果再以田口方法及全因子實驗法找出最佳化操作條件。
因受限於實廠去光阻回收系統需維持在穩定運轉狀態，故僅選用進料量、轉速、及蒸氣壓力三個可控因子進行調整，其餘可能影響薄膜蒸發器效能的因子如:真空度、不純物(光阻、水分)濃度僅先固定暫無進行測試，未來將再繼續將此二因子納入實驗並進行驗證。

關鍵字

去光阻劑回收系統

並列摘要

Stripper is called the stripped liquid, the consumption is only less than the develop chemicals of liquid in the array process of FPD, It’s mostly imported from foreign countries. And the price is extremely high. After usage, it only includes a small amount of impurity after using. Hence, the retrieving value is very much. Mostly used in the TFT LCD industry. There are two kinds of Stripper TOK106 and N300.The main composition of the TOK106 are70% MEA and DMSO 30%. And the main compositions of N300 are 70% BDG and 30% MEA. They are different only on the proportion of MEA. The TOK106 is used in the dry process while the N300 is used in the wet process.
The purpose of this research is to find out the major controlling factors for the efficiency of the thin film evaporator unit of the TFT-LCD Stripper reclaim system. The results of full factorial experiment and the Taguchi Method are compared in terms of the optimal operational values of the major controlling factors. These optimal operating parameters are used for practical operation in factory.
This research selects the feed flow rate, vapor pressure, and rotational speed as the controlling factors. And the evaporating rate of the thin film evaporator as the effect factor. The Taguchi orthogonal array table and full factorial design were employed to design the experiments
Under the restrain of keeping the reclaim system of factory at a stable running mode, we only select three controlling factors. The other factors that may influence the efficiency of the thin film evaporator such as vacuity, impurity concentration of photo resist and moisture were only fixed. These factors will be included in the future experimental plan.

並列關鍵字

Stripper reclaim system

參考文獻

13. 王啟川，熱交換器設計(I)，五南圖書，2003。

27. 范勝欽，「以實驗設計法及表面張力效應探討填充床吸收塔之影響因子及界面現象分析」，私立中原大學化學工程研究所碩士論文，2004。

16. Mckenna,T.H，”Design Model of A Wiped Film Evaporator Applications to The Devolatilisation of Polymer Melts ”，Chemical Engineer Science，453∼467,vol.50 No.3,1995。

29. Katsumi Tochigi et al.，”Isothermal Vapor-Liquid Equilibria for Water + 2-Aminoethanol + Dimethyl Sulfoxide and Its Constituent Three Binary Systems”，Journal of Chemical & Engineering ，Vol.44 No.3,P588-590，1999。

1. 財團法人塑膠工業技術發展中心，塑膠e學苑，塑膠商情新聞2006.12.05，網址:http://www.pidc.org.tw/default.aspx。