本研究是利用成本低且能快速而有效提昇產品品質的田口方法,來探討光學薄膜最佳化之製程參數,本研究選擇四個製程控制因子為:離子束電壓、離子束電流、基板溫度與蒸鍍速率,並透過直交表(Orthogonal Array)進行實驗設計,以離子束輔助沉積系統來完成九組實驗樣本,並利用光譜分析儀取得薄膜的穿透率後再計算出薄膜折射率,最後透過望大型品質特性值信號雜訊比之計算並完成S/N比回應圖/表,推測出一組最佳製程參數,接著經由再現性的實驗驗證,得到最佳製程參數為:離子束電壓180V、離子束電流4A、基板溫度250℃與蒸鍍速率3??/Sec,可得到最佳氧化鈦薄膜的折射率為2.492,比原來的製程提升17.27%,並可節省27.57%的製造成本,本研究結果並發現控制因子中以離子束電壓與基板溫度對氧化鈦薄膜折射率的影響較顯著。
This study is the use of low-cost and can quickly and effectively improve product quality Taguchi method to study the optimization of optical thin-film manufacturing process parameters. Choice four types of process control factor: Ion-Beam Voltage, Ion-Beam Current, Substrate Temperature, and Evaporation Rate. Through Orthogonal Array Table experiment design. By Ion-Beam Assisted Deposition(IAD) system to the completion of the nine test samples, optical spectrum analyzer to measure thin-film penetration, and calculation of the refractive index of thin-films. Calculation of Larger-The-Better (LTB) of Signal-to-Noise Ratio (S/N) and response tables/graphs, that a group of the best process parameters, by the reproducibility of the experimental verification, the optimal process parameters are: Ion-Beam Voltage of 180 volts, Ion-Beam Current of 4 amps, Substrate Temperature 250 ℃ and Evaporation Rate of 3??/Sec, refractive index of titanium dioxide thin film was 2.492., than the reasons for the upgrade process 17.27%, and save 27.57% of manufacturing costs, the results of this study and found that the control factor in the Ion-Beam Voltage and Substrate Temperature on the refractive index of titanium dioxide thin films more significant impact.