透過您的圖書館登入
IP:3.129.23.30
  • 學位論文

殘留氣體分析儀在真空設備之應用

Applications of Residual Gas Analyzer in Vacuum Facilities

指導教授 : 蔡瑞益
若您是本文的作者,可授權文章由華藝線上圖書館中協助推廣。

摘要


摘要 殘留氣體分析儀(簡稱RGA ;Residual Gas Analyzer)被應用於真空領域已超過三十多年,早期它們的角色僅在於真空測漏、故障原因分析,近年來由於電腦資訊系統的發達,RGA已逐漸與各半導體製程設備相結合,其角色也已轉變成屬於產線設備之一環。 RGA主要是運用質譜儀的原理去偵測氣體分子,其主要構造包括離子源、四極柱質譜儀以及離子量測器。當氣體樣品進入殘留氣體分析儀時,會被高速電子撞擊成不同質量的帶正電離子,通常我們用質量與電荷數( )來代表此氣體分子的分子量。 一般而言,確保腔體(Chamber)的真空是否有漏,除了可用氦氣測漏儀或以真空計去量測真空壓力上升的情況,另一方式即是可以使用RGA,去探討腔體是否有洩漏,由於RGA可直接安裝在腔體上,即時監控製程,因此最近幾年RGA己運用於物理氣象沈積(PVD)或化學氣象沈積(CVD)等相關積體電路製程設備上。 RGA除了可用於腔體(Chamber)內現場殘留氣體的分析,也可透過電腦資訊平台的整合,全方位地檢測、收集和儲存量測數據.因此本研究除了探討RGA在真空測漏的應用,也將介紹業界如何使用RGA即時地監控各製程的變化.

並列摘要


ABSTRACT Residual Gas Analyzers (RGAs) has been used in vacuum research applications for more than thirty years. In the past, their role has only focused in leak detector and trouble-shooting. Recently, RGA evolved to a production tool and combined with the IC machines. The RGA is commonly used the mass spectrum to detect the residual gases. The main structures are including ion source, quadrupole and ion detector. When gases flow into RGA, they will be bumped to positive ions by high electron. Typically, we used mass to charge to identify the molecular weight of the gas. Generally speaking, we can use He detector or vacuum gauge to measure the vacuum pressure in case the chamber is leak or not. On the other hand, we also can use RGA to confer the chamber performance. Since RGA can install in the chamber directly monitoring the in-situ process, it has application in PVD and CVD process. Not only RGA can overall analyze the in-line residual gas, but also detect, collect and save the measurement data all around by the computer platform. Finally, we will discuss the RGA in the leak detector of vacuum applications and introduce how RGA can in-situ monitor the variable of process in this research.

並列關鍵字

Residual Gas Analyzer

參考文獻


【1】J D Herbert, CLRC Daresbury Lab, Warrington WA4 4AD, U.K. “Residual Gas Analysis on the Daresbury Synchrotron Light Source”. (1996).
參考文獻
【2】徐逸明,化學氣相沉積法及電漿輔助化學氣相沉積法於低溫合成奈米碳管之研究,國立成功大學化學工程學系(2001)
【3】劉憶蓉,四極質譜儀在半導體廠鎢化學蒸氣沉積製程尾氣監測之應用,國立高雄第一科技大學環境與工程衛生系(2000).
【4】盧哲明,半導體廠高密度電漿化學蒸氣沉積製程尾氣監測及處理設備效率評估分析,國立高雄第一科技大學環境與工程衛生系(2000).

被引用紀錄


丁仁奎(2009)。硫醇基丙基三甲氧基矽烷應用於封裝植入式電子功能器之玻璃與白金電極孔隙之探討〔碩士論文,中原大學〕。華藝線上圖書館。https://doi.org/10.6840/CYCU.2009.00885
Chou, C. L. (2015). 氣 氛對(001)優選方位鐵鉑單層薄膜之影響 [master's thesis, Feng Chia University]. Airiti Library. https://doi.org/10.6341/fcu.M0211696

延伸閱讀